Magnetic, structural and cation distribution studies on [Formula: see text] (x = 0.00, 0.02, 0.04, 0.06 and 0.1) nanoparticles.

We synthesized and characterized the colloidal suspensions of [Formula: see text] nanoparticles with x = 0.00, 0.02, 0.04, 0.06 and 0.1. The effect of the Fe3+ ion replacement by Nd3+ on the crystal structure is in-depth studied. The samples were characterized by the following techniques: X-ray diffraction (XRD), UV-Vis spectrophotometry, transmission electronic microscopy (TEM), small-angle X-ray scattering (SAXS), magnetization as a function of applied magnetic field (M-H loops) and magnetization as a function of temperature in zero-field-cooled and field-cooled regimes (ZFC-FC). From XRD cation distribution, structural parameters were extracted. The increasing in the bandgap is interpreted as a result of the higher interatomic separation with the doping. TEM micrographs reveal a polydisperse size and shape distribution of particles. The results for the volume-weighted average diameter measured by SAXS are consistent with those determined by XRD. From the M-H loops we found that the superparamagnetic (SPM) regime contributes with 95-97% for all samples, while only 3-5% contribution comes from the paramagnetic (PM) regime. The saturation magnetization increases in a steady manner upon increasing the Nd3+ ion molar ratio from 0.00 up to 0.06, reaching the maximum value of 105.8±0.4 Am2/kg at x = 0.06. It is worth to mention that the result for the saturation magnetization value are higher than that of the bulk material.

Cell growth on 3D microstructured surfaces.

Chinese Hamster Ovary (CHO) cell cultures were grown on surfaces lithographed with periodic 3D hexagonal microcavity array morphology. The range of microcavity size (inscribed circle diameter) was from 12 µm to 560 µm. CHO cells were grown also on flat surfaces. The characterization was performed with respect to cell growth density (number of nuclei per unit area) by fluorescence optical microscopy and evaluated by correlation function analysis. We found that optimum microcavity radius was 80 µm, concerning to the maximum cell growth density, being even greater than the growth density on a flat (unstructured) substrate of the same material. This finding can be important for optimization of biotechnological processes and devices.

Gold ion implantation into alumina using an "inverted ion source" configuration.

We describe an approach to ion implantation in which the plasma and its electronics are held at ground potential and the ion beam is injected into a space held at high negative potential, allowing considerable savings both economically and technologically. We used an "inverted ion implanter" of this kind to carry out implantation of gold into alumina, with Au ion energy 40 keV and dose (3-9) × 10(16) cm(-2). Resistivity was measured in situ as a function of dose and compared with predictions of a model based on percolation theory, in which electron transport in the composite is explained by conduction through a random resistor network formed by Au nanoparticles. Excellent agreement is found between the experimental results and the theory.

Performance of an inverted ion source.

Whereas energetic ion beams are conventionally produced by extracting ions (say, positive ions) from a plasma that is held at high (positive) potential, with ion energy determined by the potential drop through which the ions fall in the beam formation electrode system, in the device described here the plasma and its electronics are held at ground potential and the ion beam is formed and injected energetically into a space maintained at high (negative) potential. We refer to this configuration as an "inverted ion source." This approach allows considerable savings both technologically and economically, rendering feasible some ion beam applications, in particular small-scale ion implantation, that might otherwise not be possible for many researchers and laboratories. We have developed a device of this kind utilizing a metal vapor vacuum arc plasma source, and explored its operation and beam characteristics over a range of parameter variation. The downstream beam current has been measured as a function of extraction voltage (5-35 kV), arc current (50-230 A), metal ion species (Ti, Nb, Au), and extractor grid spacing and beamlet aperture size (3, 4, and 5 mm). The downstream ion beam current as measured by a magnetically-suppressed Faraday cup was up to as high as 600 mA, and with parametric variation quite similar to that found for the more conventional metal vapor vacuum arc ion source.

Environmental effects in Kelvin force microscopy of modified diamond surfaces.

We have explored the effects of atmospheric environment on Kelvin force microscopy (KFM) measurements of potential difference between different regions of test polycrystalline diamond surfaces. The diamond films were deposited by microwave plasma-assisted chemical vapor deposition, which naturally produces hydrogen terminations on the surface of the films formed. Selected regions were patterned by electron-beam lithography and chemical terminations of oxygen or fluorine were created by exposure to an oxygen or fluorine plasma source. For KFM imaging, the samples were mounted in a hood with a constant flow of helium gas. Successive images were taken over a 5-h period showing the effect of the environment on KFM imaging. We conclude that the helium flow removes water molecules adsorbed on the surface of the samples, resulting in differences in surface potential between adjacent regions. The degree of water removal is different for surfaces with different terminations. The results highlight the importance of taking into account the atmospheric environment when carrying out KFM analysis.

A high voltage pulse power supply for metal plasma immersion ion implantation and deposition.

We describe the design and implementation of a high voltage pulse power supply (pulser) that supports the operation of a repetitively pulsed filtered vacuum arc plasma deposition facility in plasma immersion ion implantation and deposition (Mepiiid) mode. Negative pulses (micropulses) of up to 20 kV in magnitude and 20 A peak current are provided in gated pulse packets (macropulses) over a broad range of possible pulse width and duty cycle. Application of the system consisting of filtered vacuum arc and high voltage pulser is demonstrated by forming diamond-like carbon (DLC) thin films with and without substrate bias provided by the pulser. Significantly enhanced film∕substrate adhesion is observed when the pulser is used to induce interface mixing between the DLC film and the underlying Si substrate.