Physics of reflective optics for the soft gamma-ray photon energy range.

Traditional multilayer reflective optics that have been used in the past for imaging at x-ray photon energies as high as 200 keV are governed by classical wave phenomena. However, their behavior at higher energies is unknown, because of the increasing effect of incoherent scattering and the disagreement between experimental and theoretical optical properties of materials in the hard x-ray and gamma-ray regimes. Here, we demonstrate that multilayer reflective optics can operate efficiently and according to classical wave physics up to photon energies of at least 384 keV. We also use particle transport simulations to quantitatively determine that incoherent scattering takes place in the mirrors but it does not affect the performance at the Bragg angles of operation. Our results open up new possibilities of reflective optical designs in a spectral range where only diffractive optics (crystals and lenses) and crystal monochromators have been available until now.

Development and calibration of mirrors and gratings for the soft x-ray materials science beamline at the Linac Coherent Light Source free-electron laser.

This work discusses the development and calibration of the x-ray reflective and diffractive elements for the Soft X-ray Materials Science (SXR) beamline of the Linac Coherent Light Source (LCLS) free-electron laser (FEL), designed for operation in the 500 to 2000 eV region. The surface topography of three Si mirror substrates and two Si diffraction grating substrates was examined by atomic force microscopy (AFM) and optical profilometry. The figure of the mirror substrates was also verified via surface slope measurements with a long trace profiler. A boron carbide (B4C) coating especially optimized for the LCLS FEL conditions was deposited on all SXR mirrors and gratings. Coating thickness uniformity of 0.14 nm root mean square (rms) across clear apertures extending to 205 mm length was demonstrated for all elements, as required to preserve the coherent wavefront of the LCLS source. The reflective performance of the mirrors and the diffraction efficiency of the gratings were calibrated at beamline 6.3.2 at the Advanced Light Source synchrotron. To verify the integrity of the nanometer-scale grating structure, the grating topography was examined by AFM before and after coating. This is to our knowledge the first time B4C-coated diffraction gratings are demonstrated for operation in the soft x-ray region.

Predicting the coherent X-ray wavefront focal properties at the Linac Coherent Light Source (LCLS) X-ray free electron laser.

The first X-ray free electron laser (XFEL) at keV energies will be the Linac Coherent Light Source (LCLS), located at the SLAC National Accelerator Laboratory. Scheduled to begin operation in 2009, this first-of-a-kind X-ray source will produce ultra-short X-ray pulses of unprecedented brightness in the 0.8 to 8 keV first harmonic photon energy regime. Much effort has been invested in predicting and modeling the XFEL photon source properties at the undulator exit; however, as most LCLS experiments are ultimately dependent on the beam focal spot properties it is equally as important to understand the XFEL beam at the endstations where the experiments are performed. Here, we use newly available precision surface metrology data from actual LCLS mirrors combined with a scalar diffraction model to predict the LCLS beam properties in the experiment chambers.

Sub-diffraction-limited multilayer coatings for the 0.3 numerical aperture micro-exposure tool for extreme ultraviolet lithography.

Multilayer coating results are discussed for the primary and secondary mirrors of the micro-exposure tool (MET): a 0.30 NA lithographic imaging system with a 200 microm x 600 microm field of view at the wafer plane, operating in the extreme ultraviolet (EUV) region at an illumination wavelength around 13.4 nm. Mo/Si multilayers were deposited by DC-magnetron sputtering on large-area, curved MET camera substrates. A velocity modulation technique was implemented to consistently achieve multilayer thickness profiles with added figure errors below 0.1 nm rms demonstrating sub-diffraction-limited performance, as defined by the classical diffraction limit of Rayleigh (0.25 waves peak to valley) or Marechal (0.07 waves rms). This work is an experimental demonstration of sub-diffraction- limited multilayer coatings for high-NA EUV imaging systems, which resulted in the highest resolution microfield EUV images to date.

Atomic force microscopy characterization of Zerodur mirror substrates for the extreme ultraviolet telescopes aboard NASA's Solar Dynamics Observatory.

The high-spatial frequency roughness of a mirror operating at extreme ultraviolet (EUV) wavelengths is crucial for the reflective performance and is subject to very stringent specifications. To understand and predict mirror performance, precision metrology is required for measuring the surface roughness. Zerodur mirror substrates made by two different polishing vendors for a suite of EUV telescopes for solar physics were characterized by atomic force microscopy (AFM). The AFM measurements revealed features in the topography of each substrate that are associated with specific polishing techniques. Theoretical predictions of the mirror performance based on the AFM-measured high-spatial-frequency roughness are in good agreement with EUV reflectance measurements of the mirrors after multilayer coating.

High-performance Mo-Si multilayer coatings for extreme-ultraviolet lithography by ion-beam deposition.

An ion-beam deposition system has been used to fabricate Mo-Si multilayer coatings for masks and imaging optics to be used for extreme-ultraviolet lithography. In addition to high reflectivity and excellent profile control, ion-beam deposition has the capability to smooth rough substrates. For example, we achieved reflectivity of 66.8% on a substrate with 0.39-nm roughness. Smoothing can be further enhanced with a second ion source directed at the multilayer coating. The smoothing capabilities relax the requirement on the finish of the mirror and the mask substrates and could dramatically reduce the cost of these components. Thickness profile control is in the +/-0.01% range, and the figure error added to the mirror substrate by errors in the multilayer thickness is less than 0.1 nm. Peak reflectivities obtained on smooth substrates are 67.5-68.6%.