Black goes green: single-step solvent exchange for sol-gel synthesis of carbon spherogels as high-performance supercapacitor electrodes.

Nanoporous carbon materials with customized structural features enable sustainable and electrochemical applications through improved performance and efficiency. Carbon spherogels (highly porous carbon aerogel materials consisting of an assembly of hollow carbon nanosphere units with uniform diameters) are desirable candidates as they combine exceptional electrical conductivity, bespoke shell porosity, tunability of the shell thickness, and a high surface area. Herein, we introduce a novel and more environmentally friendly sol-gel synthesis of resorcinol-formaldehyde (RF) templated by polystyrene spheres, forming carbon spherogels in an organic solvent. By tailoring the molar ratio of resorcinol to isopropyl alcohol (R/IPA) and the concentration of polystyrene, the appropriate synthesis conditions were identified to produce carbon spherogels with adjustable wall thicknesses. A single-step solvent exchange process from deionized water to isopropyl alcohol reduces surface tension within the porous gel network, making this approach significantly time and cost-effective. The lower surface tension of IPA enables solvent extraction under ambient conditions, allowing for direct carbonization of RF gels while maintaining a specific surface area loss of less than 20% compared to supercritically dried counterparts. The specific surface areas obtained after physical activation with carbon dioxide are 2300-3600 m2 g-1. Transmission and scanning electron microscopy verify the uniform, hollow carbon sphere network morphology. Specifically, those carbon spherogels are high-performing electrodes for energy storage in a supercapacitor setup featuring a specific capacitance of up to 204 F g-1 at 200 mA g-1 using 1 M potassium hydroxide (KOH) solution as the electrolyte.

Dewetting-Assisted Patterning: A Lithography-Free Route to Synthesize Black and Colored Silicon.

We report the use of thermal dewetting to structure gold-based catalytic etching masks for metal-assisted chemical etching (MACE). The approach involves low-temperature dewetting of metal films to generate metal holey meshes with tunable morphologies. Combined with MACE, dewetting-assisted patterning is a simple, benchtop route to synthesize Si nanotubes, Si nanowalls, and Si nanowires with defined dimensions and optical properties. The approach is compatible with the synthesis of both black and colored nanostructured silicon substrates. In particular, we report the lithography-free fabrication of silicon nanowires with diameters down to 40 nm that support leaky wave-guiding modes, giving rise to vibrant colors. Additionally, micrometer-sized areas with tunable film composition and thickness were patterned via shadow masking. After dewetting and MACE, such patterned metal films produced regions with distinct nanostructured silicon morphologies and colors. To-date, the fabrication of colored silicon has relied on complicated nanoscale patterning processes. Dewetting-assisted patterning provides a simpler alternative that eliminates this requirement. Finally, the simple transfer of resonant SiNWs into ethanolic solutions with well-defined light absorption properties is reported. Such solution-dispersible SiNWs could open new avenues for the fabrication of ultrathin optoelectronic devices with enhanced and tunable light absorption.

Self-Assembled Au Nanoparticle Monolayers on Silicon in Two- and Three-Dimensions for Surface-Enhanced Raman Scattering Sensing.

Gold nanoparticle/silicon composites are canonical substrates for sensing applications because of their geometry-dependent physicochemical properties and high sensing activity via surface-enhanced Raman spectroscopy (SERS). The self-assembly of gold nanoparticles (AuNPs) synthesized via wet-chemistry on functionalized flat silicon (Si) and vertically aligned Si nanowire (VA-SiNW) arrays is a simple and cost-effective approach to prepare such substrates. Herein, we report on the critical parameters that influence nanoparticle coverage, aggregation, and assembly sites in two- and three-dimensions to prepare substrates with homogeneous optical properties and SERS activity. We show that the degree of AuNP aggregation on flat Si depends on the silane used for the Si functionalization, while the AuNP coverage can be adjusted by the incubation time in the AuNP solution, both of which directly affect the substrate properties. In particular, we report the reproducible synthesis of nearly touching AuNP chain monolayers where the AuNPs are separated by nanoscale gaps, likely to be formed due to the capillary forces generated during the drying process. Such substrates, when used for SERS sensing, produce a uniform and large enhancement of the Raman signal due to the high density of hot spots that they provide. We also report the controlled self-assembly of AuNPs on VA-SiNW arrays, which can provide even higher Raman signal enhancement. The directed assembly of the AuNPs in specific regions of the SiNWs with a control over NP density and monolayer morphology (i.e., isolated vs nearly touching NPs) is demonstrated, together with its influence on the resulting SERS activity.

Recent Advances in Structuring and Patterning Silicon Nanowire Arrays for Engineering Light Absorption in Three Dimensions.

Vertically aligned silicon nanowire (VA-SiNW) arrays can significantly enhance light absorption and reduce light reflection for efficient light trapping. VA-SiNW arrays thus have the potential to improve solar cell design by providing reduced front-face reflection while allowing the fabrication of thin, flexible, and efficient silicon-based solar cells by lowering the required amount of silicon. Because their interaction with light is highly dependent on the array geometry, the ability to control the array morphology, functionality, and dimension offers many opportunities. Herein, after a short discussion about the remarkable optical properties of SiNW arrays, we report on our recent progress in using chemical and electrochemical methods to structure and pattern SiNW arrays in three dimensions, providing substrates with spatially controlled optical properties. Our approach is based on metal-assisted chemical etching (MACE) and three-dimensional electrochemical axial lithography (3DEAL), which are both affordable and large-scale wet-chemical methods that can provide a spatial resolution all the way down to the sub-5 nm range.