Emissions of Tetrafluoromethane (CF4) and Hexafluoroethane (C2F6) From East Asia: 2008 to 2019.

The perfluorocarbons (PFCs), tetrafluoromethane (CF4) and hexafluoroethane (C2F6), are potent greenhouse gases with very long atmospheric lifetimes. They are emitted almost entirely from industrial sources, including the aluminum and rare earth metal smelting industries that emit them as by-products, and the semiconductor and flat panel display manufacturing industries that use them and vent unutilized amounts to the atmosphere. Despite extensive industrial efforts to quantify and curb these emissions, "top-down" PFC emission estimates derived from atmospheric measurements continue to rise and are significantly greater than reported process- and inventory-based "bottom-up" emissions. In this study, we estimate emissions of CF4 and C2F6 from East Asia, where PFC emitting industries are heavily concentrated, using a top-down approach (a Bayesian inversion) with high-frequency atmospheric measurements at Gosan (Jeju Island, South Korea) for 2008-2019. We also compile and analyze the available bottom-up CF4 and C2F6 emissions in East Asia from industrial and government reports. Our results suggest that the observed increases in global PFC emissions since 2015 are driven primarily by China's aluminum industry, with significant contributions from Japan's and Korea's semiconductor industry. Our analysis suggests that Chinese emissions occur predominantly from the aluminum industry, although their emissions per production ratio may be improving. Our results for Japan and Korea find significant discrepancies between top-down and bottom-up emissions estimates, suggesting that the effectiveness of emission reduction systems (abatement) used in their semiconductor industries may be overestimated. Overall, our top-down results for East Asia contribute significantly to reducing the gap in the global PFC emission budgets.

Quantitative fluctuation electron microscopy in the STEM: methods to identify, avoid, and correct for artifacts.

Fluctuation electron microscopy can reveal the nanoscale order in amorphous materials via the statistical variance in the scattering intensity as a function of position, scattering vector, and resolution. However, several sources of experimental artifacts can seriously affect the magnitude of the variance peaks. The use of a scanning transmission electron microscope for data collection affords a convenient means to check whether artifacts are present. As nanodiffraction patterns are collected in serial, any spatial or temporal dependence of the scattering intensity across the series can easily be detected. We present examples of the major types of artifact and methods to correct the data or to avoid the problem experimentally. We also re-cast the statistical formalism used to identify sources of noise in view of the present results. The present work provides a basis on which to perform fluctuation electron microscopy with a high level of reliability and confidence in the quantitative magnitude of the data.

Observation of the role of subcritical nuclei in crystallization of a glassy solid.

Phase transformation generally begins with nucleation, in which a small aggregate of atoms organizes into a different structural symmetry. The thermodynamic driving forces and kinetic rates have been predicted by classical nucleation theory, but observation of nanometer-scale nuclei has not been possible, except on exposed surfaces. We used a statistical technique called fluctuation transmission electron microscopy to detect nuclei embedded in a glassy solid, and we used a laser pump-probe technique to determine the role of these nuclei in crystallization. This study provides a convincing proof of the time- and temperature-dependent development of nuclei, information that will play a critical role in the development of advanced materials for phase-change memories.