RESUMO
In this paper we discuss the development of a MEMS-based solid state atom source that can provide controllable atom deposition ranging over eight orders of magnitude, from ten atoms per square micron up to hundreds of atomic layers, on a target â¼1 mm away. Using a micron-scale silicon plate as a thermal evaporation source we demonstrate the deposition of indium, silver, gold, copper, iron, aluminum, lead and tin. Because of their small sizes and rapid thermal response times, pulse width modulation techniques are a powerful way to control the atomic flux. Pulsing the source with precise voltages and timing provides control in terms of when and how many atoms get deposited. By arranging many of these devices into an array, one has a multi-material, programmable solid state evaporation source. These micro atom sources are a complementary technology that can enhance the capability of a variety of nano-fabrication techniques.
RESUMO
Semiconductor fabs are large, complex industrial sites with costs for a single facility approaching $10B. In this paper we discuss the possibility of putting the entire functionality of such a fab onto a single silicon chip. We demonstrate a path forward where, for certain applications, especially at the nanometer scale, one can consider using a single chip approach for building devices with significant potential cost savings. In our approach, we build micro versions of the macro machines one typically finds in a fab, and integrating all the components together. We argue that the technology now exists to allow one to build a Fab on a Chip.
RESUMO
We present a microelectromechanical system (MEMS) based method for the resist-free patterning of nanostructures. Using a focused ion beam to customize larger MEMS machines, we fabricate apertures with features less than 50 nm in diameter on plates that can be moved with nanometer precision over an area greater than 20 × 20 µm(2). Depositing thermally evaporated gold atoms though the apertures while moving the plate results in the deposition of nanoscale metal patterns. Adding a shutter positioned micrometers above the aperture enables high speed control of not only where but also when atoms are deposited. With this shutter, different-sized apertures can be opened and closed selectively for nanostructure fabrication with features ranging from nano- to micrometers in scale. The ability to evaporate materials with high precision, and thereby fabricate circuits and structures in situ, enables new kinds of experiments based on the interactions of a small number of atoms and eventually even single atoms.
Assuntos
Sistemas Microeletromecânicos/instrumentação , Impressão Molecular/instrumentação , Nanopartículas/química , Nanopartículas/ultraestrutura , Nanotecnologia/instrumentação , Desenho de Equipamento , Análise de Falha de EquipamentoRESUMO
Mode-division multiplexing over 33-km few-mode fiber is investigated. It is shown that 6×6 MIMO processing can be used to almost completely compensate for crosstalk and intersymbol interference due to mode coupling in a system that transmits uncorrelated 28-GBaud QPSK signals on the six spatial and polarization modes supported by a novel few-mode fiber.