Solution Mask Liquid Lithography (SMaLL) for One-Step, Multimaterial 3D Printing.

A novel methodology for printing 3D objects with spatially resolved mechanical and chemical properties is reported. Photochromic molecules are used to control polymerization through coherent bleaching fronts, providing large depths of cure and rapid build rates without the need for moving parts. The coupling of these photoswitches with resin mixtures containing orthogonal photo-crosslinking systems allows simultaneous and selective curing of multiple networks, providing access to 3D objects with chemically and mechanically distinct domains. The power of this approach is showcased through the one-step fabrication of bioinspired soft joints and mechanically reinforced "brick-and-mortar" structures.

Engineering Surfaces through Sequential Stop-Flow Photopatterning.

Solution-exchange lithography is a new modular approach to engineer surfaces via sequential photopatterning. An array of lenses reduces features on an inkjet-printed photomask and reproduces arbitrarily complex patterns onto surfaces. In situ exchange of solutions allows successive photochemical reactions without moving the substrate and affords access to hierarchically patterned substrates.

High-aspect-ratio bulk micromachining of titanium.

Recent process developments have permitted the highly anisotropic bulk micromachining of titanium microelectromechanical systems (MEMS). By using the metal anisotropic reactive ion etching with oxidation (MARIO) process, arbitrarily high-aspect-ratio structures with straight sidewalls and micrometre-scale features have been bulk micromachined into titanium substrates of various thicknesses, ranging from 0.5-mm sheet down to 10-microm free-standing titanium foils. Bulk micromachined structures are generally free of residual stresses and are preferred when large, rigid, flat and/or high-force actuators are desired. However, so far there has been a limited ability to select materials on the basis of specific application in bulk micromachining, primarily because of the predominance of MEMS processes dedicated to single-crystal silicon, such as silicon deep reactive ion etching. The MARIO process permits the creation of bulk titanium MEMS, which offers potential for the use of a set of material properties beyond those provided by traditional semiconductor-based MEMS. Consequently, the MARIO process enables the fabrication of novel devices that capitalize on these assets to yield enhanced functionalities that would not be possible with traditional micromechanical material systems.