RESUMO
The complex range of interactions between electrons and electromagnetic fields gave rise to countless scientific and technological advances. A prime example is photon-induced nearfield electron microscopy (PINEM), enabling the detection of confined electric fields in illuminated nanostructures with unprecedented spatial resolution. However, PINEM is limited by its dependence on strong fields, making it unsuitable for sensitive samples, and its inability to resolve complex phasor information. Here, we leverage the nonlinear, overconstrained nature of PINEM to present an algorithmic microscopy approach, achieving far superior nearfield imaging capabilities. Our algorithm relies on free-electron Ramsey-type interferometry to produce orders-of-magnitude improvement in sensitivity and ambiguity-immune nearfield phase reconstruction, both of which are optimal when the electron exhibits a fully quantum behavior. Our results demonstrate the potential of combining algorithmic approaches with state-of-the-art modalities in electron microscopy and may lead to various applications from imaging sensitive biological samples to performing full-field tomography of confined light.
RESUMO
Spatial modulation of electron beams is an essential tool for various applications such as nanolithography and imaging, yet its conventional implementations are severely limited and inherently non-tunable. Conversely, proposals of light-driven electron spatial modulation promise tunable electron wavefront shaping, for example, using the mechanism of photon-induced near-field electron microscopy. Here we present tunable photon-induced spatial modulation of electrons through their interaction with externally controlled surface plasmon polaritons (SPPs). Using recently developed methods of shaping SPP patterns, we demonstrate a dynamic control of the electron beam with a variety of electron distributions and verify their coherence through electron diffraction. Finally, the nonlinearity stemming from energy post-selection provides us with another avenue for controlling the electron shape, generating electron features far below the SPP wavelength. Our work paves the way to on-demand electron wavefront shaping at ultrafast timescales, with prospects for aberration correction, nanofabrication and material characterization.
