Carbon-Free Solution-Based Doping for Silicon.

Molecular doping is a method to dope semiconductors based on the use of liquid solutions as precursors of the dopant. The molecules are deposited on the material, forming a self-ordered monolayer that conforms to the surfaces, whether they are planar or structured. So far, molecular doping has been used with precursors of organic molecules, which also release the carbon in the semiconductor. The carbon atoms, acting as traps for charge carriers, deteriorate the doping efficiency. For rapid and extensive industrial exploitation, the need for a method that removes carbon has therefore been raised. In this paper, we use phosphoric acid as a precursor of the dopant. It does not contain carbon and has a smaller steric footprint than the molecules used in the literature, thus allowing a much higher predetermined surface density. We demonstrate doses of electrical carriers as high as 3 × 1015 #/cm2, with peaks of 1 × 1020 #/cm3, and high repeatability of the process, indicating an outstanding yield compared to traditional MD methods.

Chemical Vapor Deposition Growth of Silicon Nanowires with Diameter Smaller Than 5 nm.

Quantum confinement effects in silicon nanowires (SiNWs) are expected when their diameter is less than the size of the free exciton (with a Bohr radius ∼5 nm) in bulk silicon. However, their synthesis represents a considerable technological challenge. The vapor-liquid-solid (VLS) mechanism, mediated by metallic nanoclusters brought to the eutectic liquid state, is most widely used for its simplicity and control on the SiNWs size, shape, orientation, density, and surface smoothness. VLS growth is often performed within high-vacuum physical vapor deposition systems, where the eutectic composition and the pressure conditions define the minimum diameter of the final nanowire usually around 100 nm. In this article, we present and discuss the SiNWs' growth by the VLS method in a plasma-based chemical vapor deposition system, working in the mTorr pressure range. The purpose is to demonstrate that it is possible to obtain nanostructures with sizes well beyond the observed limit by modulating the deposition parameters, like chamber pressure and plasma power, to find the proper thermodynamic conditions for nucleation. The formation of SiNWs with sub-5 nm diameter is demonstrated.

Direct observation of single organic molecules grafted on the surface of a silicon nanowire.

Silicon nanowires inspire since decades a great interest for their fundamental scientific importance and their potential in new technologies. When decorated with organic molecules they form hybrid composites with applications in various fields, from sensors to life science. Specifically the diethyl 1-propylphosphonate/Si combination is considered as a promising alternative to the conventional semiconductor n-type doping methods, thanks to its solution-based processing, which is damage-free and intrinsically conformal. For these characteristics, it is a valid doping process for patterned materials and nanostructures such as the nanowires. Our joined experimental and theoretical study provides insights at atomistic level on the molecular activation, grafting and self-assembling mechanisms during the deposition process. For the first time to the best of our knowledge, by using scanning transmission electron microscopy the direct visualization of the single molecules arranged over the Si nanowire surface is reported. The results demonstrate that the molecules undergo to a sequential decomposition and self-assembling mechanism, finally forming a chemical bond with the silicon atoms. The ability to prepare well-defined molecule decorated Si nanowires opens up new opportunities for fundamental studies and nanodevice applications in diverse fields like physics, chemistry, engineering and life sciences.