RESUMO
Linear bosonic modes offer a hardware-efficient alternative for quantum information processing but require access to some nonlinearity for universal control. The lack of nonlinearity in photonics has led to encoded measurement-based quantum computing, which relies on linear operations but requires access to resourceful ('nonlinear') quantum states, such as cubic phase states. In contrast, superconducting microwave circuits offer engineerable nonlinearities but suffer from static Kerr nonlinearity. Here, we demonstrate universal control of a bosonic mode composed of a superconducting nonlinear asymmetric inductive element (SNAIL) resonator, enabled by native nonlinearities in the SNAIL element. We suppress static nonlinearities by operating the SNAIL in the vicinity of its Kerr-free point and dynamically activate nonlinearities up to third order by fast flux pulses. We experimentally realize a universal set of generalized squeezing operations, as well as the cubic phase gate, and exploit them to deterministically prepare a cubic phase state in 60 ns. Our results initiate the experimental field of polynomial quantum computing, in the continuous-variables notion originally introduced by Lloyd and Braunstein.
RESUMO
Evaluar el método de aplicación y tiempo de fotopolimerización de dos sistemas adhesivos autograbadores sobre esmalte. Materiales y Métodos: Fueron utilizados 30 molares, los cuales fueron divididos en 8 grupos de 10 muestras cada uno a los cuales se les aplico dos tipos de adhesivos autograbadores (1 Adhese y 2 Unniversal Single bond) de manera activa y pasiva con diferentes tiempos de fotopolimerización para evaluar la resistencia de unión de estos adhesivos autograbadores, después de la conformación de los tygon fue llevado a microcizallamiento. Resultados: Mostraron que la extensión de irradiación de luz para los adhesivos (1 Adhese y 2 Universal Single bond) no dio diferencia significativamente independientemente del tipo de aplicación (p<0.005). En cuanto al tipo de aplicación si hubo diferencia significativa para los dos adhesivos (p<005). Conclusiones: La aplicación activa aumenta los valores de resistencia de unión en adhesivos autograbadores de un paso y dos pasos en esmalte.
Introduction: To evaluate the method of application and curing time of two adhesive systems on enamel-etching. Materials and Methods: The study involved 30 molars, which were divided into 8 groups of 10 samples each in which we applied two types of self-etching adhesives (1 AdheSE and 2 Universal Single bond) actively and passively with different times of photopolymerization to evaluate the bonding strength of these etching adhesives, after forming of the tygon microshear was carried. Results: showed that the extension of light for adhesives (1 AdheSE Universal Single bond and 2) did not differ significantly regardless of the type of application (p>0.005). As for the type of applications if no significant difference for the two adhesive (p<0.005). Conclusions: The active application increases the values of bond strength of self etching adhesives one step and two steps in enamel.
