High-resolution TEM and the application of direct and indirect aberration correction.

Aberration correction leads to a substantial improvement in the directly interpretable resolution of transmission electron microscopes. Correction of the aberrations has been achieved electron-optically through a hexapole-based corrector and also indirectly by computational analysis of a focal or tilt series of images. These direct and indirect methods are complementary, and a combination of the two offers further advantages. Materials characterization has benefitted from the reduced delocalization and higher resolution in the corrected images. It is now possible, for example, to locate atomic columns at surfaces to higher accuracy and reliability. This article describes the JEM-2200FS in Oxford, which is equipped with correctors for both the image-forming and probe-forming lenses. Examples of the use of this instrument in the characterization of nanocrystalline catalysts are given together with initial results combining direct and indirect methods. The double corrector configuration enables direct imaging of the corrected probe, and a potential confocal imaging mode is described. Finally, modifications to a second generation instrument are outlined.

Local measurement and computational refinement of aberrations for HRTEM.

Methods for accurate and automated determination of the coefficients of the wave aberration function are compared with particular emphasis on measurements of higher order coefficients in corrected instruments. Experimental applications of aberration measurement to the determination of illumination isoplanicity and high precision local refinement of restored exit waves are also described.