Redox-active π-conjugated organometallic monolayers: pronounced Coulomb blockade characteristic at room temperature.

We report the electrical transport characteristics of a series of molecular wires, fc-C≡C-C6H4-SAc (fc = ferrocenyl; Ac = acetyl) and AcS-C6H4-C≡C-(fc)n-C≡C-C6H4-SAc (n = 2, 3), consisting of multiple redox-active ferrocenyl centers. The self-assembled monolayers of these molecular wires on Au surfaces were comprehensively characterized by electrochemistry and conductive atomic force microscopy techniques. Characterization of the wires revealed that electron transport is made extremely efficient by the organometallic redox states. There is a strong electronic coupling between ferrocenyl moieties, and superior electron-transport ability exists through these semirigid molecular wires. Standard rate constants for the electron transfer between the electrode and the ferrocenyl moieties were measured for the monolayers by a potential-step chronoamperometry technique. The electron conduction through the molecular wires was estimated using the monolayers as a bridge from the Au(111) metal surface to the gold tip of a conductive atomic force microscope (CAFM). Using the CAFM, Coulomb blockade behavior arising from the capacitive charging of the multinuclear redox-active molecules was observed at room temperature. The conductance switching was mediated by the presence of various ferrocenyl redox states and each current step corresponded to a specific redox state.

Constructions of silver nanowires and copper oxide microrings by a surface-formation technique.

We demonstrate a simple method to synthesize silver wires by thermal reduction of aqueous AgNO(3) droplet with catalytic anatase TiO(2) nanoparticles which were spin-coated on Si wafer. Structural characterization of the silver wires shows that the nanowires grow primarily along the [011] direction. SEM image of the silver wires clearly shows the catalytic TiO(2) nano-cluster attached to the end of the each silver wire. Since the process was surfactant-free, the silver nanowires prepared by our method retain the excellent electrical conductivity. The intrinsic resistivity calculated from the current-voltage curve for a wire with 12880.41 nm(2) cross-section area was 18.72 microohm cm, which is about 11.6 times higher than that of bulk silver (1.61 microohm cm). Our simple method can be also applied to generate CuO with ring-shaped microstructure by using ITO conducting glass as matrix. We have found that the size and reproducibility are well-controllable. A single phase of CuO ring-shaped microstructure with outer diameters ranging from approximately 13 to 17 microm and inner diameters ranging from approximately 1.4 to 3.3 microm was obtained. The composition of CuO microring was confirmed by thin-film XRD and XPS analyses.

One-step synthesis of uniform silver nanoparticles capped by saturated decanoate: direct spray printing ink to form metallic silver films.

The one-step synthesis and spectroscopic characterizations of size-controlled silver nanoparticles are described. The transmission electron microscopy (TEM), nuclear magnetic resonance (NMR), Fourier transform infrared spectroscopy (FT-IR), thermal gravimetric-mass analysis (TGA-MS) and X-ray photoelectron spectroscopy (XPS) techniques were used to characterize the decanoate-protected silver nanoparticles. TEM analysis showed that spherical nanoclusters of 7.52 +/- 0.57 nm were produced. Furthermore, the particle sizes are uniform with a narrow size distribution. For all samples, Ag 3d(5/2) and 3d(3/2) components appeared at 368.5 and 374.5 eV, respectively, in the XPS spectrum; these values compare very well with the typical values of carboxylate-protected Ag nanoparticles. A thermal analysis mass spectrometer was used to analyze the desorption behavior of decanoate-protected nanoparticles. From the desorption maximum temperatures of 181 and 263 degrees C, activation energies of 27.2 and 32.2 kcal mol(-1) for the desorption processes in the Ag MPCs were obtained, assuming a first-order reaction and using a pre-exponential factor of 1 x 10(13) s(-1). A specific resistivity of 6.097 microOmega cm for the silver metal film (0.7 microm) on a Si wafer can be produced simply by thermal annealing of an Ag monolayer-protected clusters film under an atmosphere of 90% N(2)-10% H(2) at 300 degrees C for 1 h.