Family satisfaction and self-efficacy among low-income adolescents during the COVID-19 pandemic: A comparative analysis of parents' educational attainment.

Purposes: Given that the period from middle to high school is important to develop and cultivate self-efficacy, reduced support in low-income families might negatively influence the development of self-efficacy among low-income students since COVID-19. This study aims to investigate the association between family satisfaction and self-efficacy among low-income students since COVID-19 and the moderating effect of parents' educational attainment on the relationship. Methods: 255 low-income students in South-Korea were selected for the final sample. The PROCESS macro 3.4 for Statistical Product and Service Solutions was used to analyze the data. Results: Family satisfaction was positively related to self-efficacy among low-income students. There was a significant moderating effect of parents' educational attainment on the relationship between family satisfaction and self-efficacy among low-income students during the COVID-19 pandemic. Discussion: Financial support and COVID-19 benefits should be prioritized to low-income families with adolescents to improve family relationships, leading to increase self-efficacy among low-income students. Social welfare programs targeting family relationships in low-income households should be especially targeted toward low-income households without a parent who received higher education. Life-long education should be provided to parents in low-income families who did not gain higher education as their educational attainment influences the self-efficacy of their adolescent children.

The Moderating Effect of Age on Low-Income Students' Relationships With Mentors and Their Self-Efficacy Since COVID-19.

Purposes: This study investigates the moderating effect of age on the association between relationship with mentors and self-efficacy among low-income students. Methods: A total of 255 low-income middle and high school students participated. The PROCESS macro 3.4 for Statistical Product and Service Solutions was employed to test the moderating effect. Results: Quality of relationship between mentors and mentees was positively associated with mentees' self-efficacy. Students' age significantly moderated the association between quality of the relationship with mentors and self-efficacy. Discussion: It is important to expand mentorship programs for low-income students during the COVID-19 pandemic in order to foster high self-efficacy among adolescents. Recruitment of high quality mentors and additional factors that may be helpful to a good relationship between mentees and mentors, such as mentor training, mentor screening, and mentor-mentee matching, should be prioritized to improve self-efficacy among low-income students since COVID-19. Early opportunities for mentoring from high quality mentors is particularly important to increase self-efficacy among younger students such as middle school students.

Smartphone Addiction and Depression among Low-Income Boys since COVID-19: The Moderating Effect of Being an Only Child.

Even though boys' depression has become important, and their smartphone use has increased since COVID-19, little is known about low-income middle and high school boys' depression in the context of whether they have siblings. Thus, this study investigates the relationship between smartphone addiction and depression as well as the moderating effect of being an only child on the relationship. Participants were limited to middle and high school students whose families were regarded as having a low-income. A total of 129 low-income boys were selected for the final sample. The PROCESS macro 3.4 for Statistical Product and Service Solutions was used to identify the moderating effect. Smartphone addiction was positively related to depression among low-income male students. Being an only child significantly moderated the relationship between smartphone addiction and depression. This study contributes to understanding the importance of examining mental health problems among middle school boys since COVID-19, particularly among low-income boys. It is necessary to provide tailored mental health services for middle school boys in low-income families. Alternative activities and social programs should be provided for adolescent boys who are only children to safely socialize with friends and peers without a smartphone.

Multiple Mediating Effects of Conflicts With Parents and Self-Esteem on the Relationship Between Economic Status and Depression Among Middle School Students Since COVID-19.

This study explores associations between perceived economic status and depression among middle school students during COVID-19 in the context of conflict with parents and self-esteem. Data were collected in South Korea in the fall of 2020. A total of 328 middle school students were included, and a multiple mediator model was employed to examine the multiple mediating effects. Middle schoolers' household economic status was negatively associated with their conflict with parents. Conflict with parents was negatively related to middle school students' self-esteem. Indirect effects of perceived economic status via conflict with parents were significantly associated with depression. The indirect effect of perceived economic status via both conflict with parents and self-esteem was related to depression. Government subsidies should temporarily be expanded to improve households' economic status to potentially improve middle school students' depression and to enhance relationships between children and their parents during the COVID-19 pandemic. Further, extra financial support from the government should be focused on poor households with children in order to address family conflict, self-esteem, and depression among middle school students.

The Role of a Mentorship Program on the Relationship between Neglect and Depression among Adolescents in Low-Income Families.

This study examines the moderating effect of a mentorship program on the relationship between parental neglect and depression among adolescents from low-income households since COVID-19. A total of 264 participants from all provinces in South Korea were registered for a mentorship program provided by the Korea Development Bank [KDB] Foundation, which is a charitable and non-profit organization. Two-hundred fifty-five middle and high school students from low-income families were included in the final sample. The mentorship program was provided to students based on mentors' advice and feedback. A bootstrap method using the PROCESS macro 3.4 for SPSS was utilized to examine the moderating effect of satisfaction with the mentorship program. Neglect was positively related to depression among low-income students. Satisfaction with the mentorship program moderated the relationship between low-income students' neglect and depression. Visits from social workers or other advocates or volunteers to low-income families with children may be helpful to address depression among low-income students. High quality mentorship programs should be provided to more low-income students for their mental health, funded particularly in the context of corporate social responsibility. Particularly since the COVID-19 pandemic, financial contributions by corporations would be valuable to reconstruct the damage to quality of life and psychological well-being among low-income adolescents.

Determinants of Behavioral Changes Since COVID-19 among Middle School Students.

Middle school students are of particular interest when examining the impact of the COVID-19 pandemic because they are in a formative period for socioemotional development, and because they are not as mature as adults, making them more vulnerable to the effects of the current pandemic. This study seeks to examine determinants of protective behavior changes since COVID-19 among middle school students. Participants were recruited through an official online flatform used by public schools. The final sample included 328 middle school students in South Korea. A multiple linear regression was conducted to explore what factors influence protective behavior changes since COVID-19. Gender and health status were associated with protective behavior changes since COVID-19. Family satisfaction was positively associated with protective behavior changes. Levels of sanitation since COVID-19 and perceptions regarding the risk of COVID-19 were significantly related to protective behavior changes. This study suggests to consider three factors-individual, family, and environmental-in order to prevent middle school students from contracting and spreading the virus.

Effects of Bias Pulsing on Etching of SiO2 Pattern in Capacitively-Coupled Plasmas for Nano-Scale Patterning of Multi-Level Hard Masks.

In order to study the effects of bias pulsing on the etching characteristics of a silicon dioxide (SiO2) layer using multi-level hard mask (MLHM) structures of ArF photoresist/bottom anti-reflected coating/SiO2/amorphous carbon layer (ACL)/SiO2, the effects of bias pulsing conditions on the etch characteristics of a SiO2 layer with an ACL mask pattern in C4F8/CH2F2/O2/Ar etch chemistries were investigated in a dual-frequency capacitively-coupled plasma (CCP) etcher. The effects of the pulse frequency, duty ratio, and pulse-bias power in the 2 MHz low-frequency (LF) power source were investigated in plasmas generated by a 27.12 MHz high-frequency (HF) power source. The etch rates of ACL and SiO2 decreased, but the etch selectivity of SiO2/ACL increased with decreasing duty ratio. When the ACL and SiO2 layers were etched with increasing pulse frequency, no significant change was observed in the etch rates and etch selectivity. With increasing LF pulse-bias power, the etch rate of ACL and SiO2 slightly increased, but the etch selectivity of SiO2/ACL decreased. Also, the precise control of the critical dimension (CD) values with decreasing duty ratio can be explained by the protection of sidewall etching of SiO2 by increased passivation. Pulse-biased etching was successfully applied to the patterning of the nano-scale line and space of SiO2 using an ACL pattern.

Pulse-biased etching of Si3N4-layer in capacitively-coupled plasmas for nano-scale patterning of multi-level resist structures.

Pulse-biased plasma etching of various dielectric layers is investigated for patterning nano-scale, multi-level resist (MLR) structures composed of multiple layers via dual-frequency, capacitively-coupled plasmas (CCPs). We compare the effects of pulse and continuous-wave (CW) biasing on the etch characteristics of a Si3N4 layer in CF4/CH2F2/O2/Aretch chemistries using a dual-frequency, superimposed CCP system. Pulse-biasing conditions using a low-frequency power source of 2 MHz were varied by controlling duty ratio, period time, power, and the gas flow ratio in the plasmas generated by the 27.12 MHz high-frequency power source. Application of pulse-biased plasma etching significantly affected the surface chemistry of the etched Si3N4 surfaces, and thus modified the etching characteristics of the Si3N4 layer. Pulse-biased etching was successfully applied to patterning of the nano-scale line and space pattern of Si3N4 in the MLR structure of KrF photoresist/bottom anti-reflected coating/SiO2/amorphous carbon layer/Si3N4. Pulse-biased etching is useful for tuning the patterning of nano-scale dielectric hard-mask layers in MLR structures.