Early stages in the self-organization of Si nanopatterns induced by ion bombardment.

We reveal early stages of self-organization of nanopatterns created by 2 keV Cs+ ion-beam irradiation of a Si surface coated with Au and a Ti adhesion layer. After ion-beam etching of the metallic layers, at normal incidence, we first observe distinct transient stages: (I) a dewetting-like pattern of grooves in the Si amorphized layer, sparsely populated with holes, followed by (II) the coexistence of rounded mounds and faceted holes distributed on a flat surface, the latter being an indication of the decisive role played by the crystalline/amorphous interface. Subsequently, the system evolves to stage III, a nanopattern of densely packed nanodots convoluted with a long-wavelength surface corrugation. A momentum-space analysis shows that stages (I) and (II) are identified, respectively, with channel-type and sphere-type quasi order.

Alternative uses of a megavolt tandem accelerator for few-keV studies with ion-source SIMS monitoring.

We increase the versatility of a tandem electrostatic accelerator by implementing simple modifications to the standard operation procedure. While keeping its ability to deliver MeV ion beams, we show that the experimental setup can (i) provide good quality ion beams in the few-keV energy range and (ii) be used to study ion-beam surface modification with simultaneous secondary ion mass spectrometry. This latter task is accomplished without using any chamber connected to the accelerator exit. We perform mass spectrometry of the few-keV anions produced in the ion source by measuring their neutral counterparts at the accelerator exit with energies up to 1.7 MeV. With an additional modification, a high-current few-keV regime is obtained, using the ion source as an irradiation chamber and the accelerator itself only as a mass spectrometer. As an example of application, we prepare a sample for the study of ion-beam assisted dewetting of a thin Au film on a Si substrate.