Field dependent study on the impact of co-evaporated multihits and ion pile-up for the apparent stoichiometric quantification of GaN and AlN.

For atom probe tomography, multihits and any associated ion pile-up are viewed as an "Achilles" heel when trying to establish accurate stoichiometric quantification. A significant reason for multihits and ion pile-up is credited to co-evaporation events. The impact is the underestimation of one or more elements present due to detector inadequacies when the field evaporated ions are spatially and temporally close. Nitride materials, especially GaN and AlN, have been shown to suffer a strong field dependent compositional bias, with N having the characteristics for being a species prone to ion pile-up. In this paper we have explored through field dependent measurements on GaN and AlN the associated impact of co-evaporated multihits and ion pile-up. To achieve this a normal CAMECA electrode along with a specially modified GRID electrode, which was designed to manipulate co-evaporated ions and hence ion pile-up, were employed. From our results and in-depth analysis, any co-evaporation and associated ion pile-up is found to be either very small, or not species dependent. Thus, ion pile-up cannot be attributed as the cause for the significant N underestimation observed in these materials.

Potential sources of compositional inaccuracy in the atom probe tomography of InxGa1-xAs.

With the objective of applying laser-assisted atom probe tomography to compositional analysis within nanoscale InGaAs devices, experimental conditions that may provide an accurate composition estimate were sought by extensively studying an InGaAs blanket film. Overall, the determined arsenic atomic fraction was found to exhibit an electric field dependent deficiency, which was more pronounced at low field conditions. Although the determined group III site-fraction also showed a (weak) field-dependent deficiency at low field conditions, it remained invariant with analysis conditions and in close agreement with the nominal value at higher field. In this study, we investigate and discuss the mechanisms that could potentially contribute to As underestimation. Given the field dependence observed, the phenomena occurring between low and high field conditions are compared. At low field, the tendency of As to field evaporate in significant amounts as multiply charged cluster ions (Asni+ with n as large as 9 and i = 1,2,3) is shown to be a significant source of compositional inaccuracy. These clusters may lead to peak overlap in the mass spectrum (e.g. the peak at 150 Da may represent As42+ or As2+ or both), thereby creating an uncertainty in the quantification. Emitted clusters may also dissociate with the likelihood of neutral generation and multi-hit losses being non-negligible. Experimental studies and density functional theory calculations are presented to characterize cluster stability and its contribution to measurement uncertainty. Under high field conditions, although fewer clusters are detected and the composition appears more accurate, the emergence of two additional mechanisms, i.e., multi-hits and DC evaporation, may degrade the data quality. The challenges in evaluating the impact of all these loss mechanisms are examined in detail. Finally, we show that for InGaAs under UV illumination, due to the laser-tip interaction, the resulting asymmetric electric field distribution across the apex introduces local atomic fraction variations.

Atom probe of GaN/AlGaN heterostructures: The role of electric field, sample crystallography and laser excitation on quantification.

Scaling and non-planar architectures are key factors helping to advance the semiconductor field. Accurate 3-dimensional atomic scale information is therefore sought but this presents a significant metrology challenge. Atom probe tomography has emerged as a strong candidate to fulfill this role, but before it can be considered an accurate and precise metrology method, numerous difficulties need to be overcome. In this paper we highlight some of these in respect to the analysis of GaN/AlGaN device heterostructures. Although a significant range of conditions for accurate GaN stoichiometric analysis were readily achieved, a more limited range of analysis conditions that yielded an accurate Al site fraction for AlGaN was observed because the Al was typically overestimated. Moreover, the low index planes of the material resulted in pole and zone lines given their lower evaporation fields and are clearly observed on the detector due to related ion trajectory aberrations representative of local field variations present. As a result of the strong compositional bias of GaN analysis with field, the Ga and N concentrations were found to vary by ∼20 at.% over the tip apex. For the AlGaN this variation was smaller (<4 at.%), even for a similar magnitude of tip field variation.

Two-Parameter Quasi-Ballistic Transport Model for Nanoscale Transistors.

We show that by adding only two fitting parameters to a purely ballistic transport model, we can accurately characterize the current-voltage characteristics of nanoscale MOSFETs. The model is an extension of Natori's model and includes transmission probability and drain-channel coupling parameter. The latter parameter gives rise to a theoretical RON that is significantly larger than those predicted previously. To validate our model, we fabricated n-channel MOSFETs with varying channel lengths. We show the length dependence of these parameters to support a quasi-ballistic description of our devices.