RESUMO
An improved quartz crystal microbalance measurement method is described, which allows us to determine erosion, implantation, and release rates of thin films, during changing temperatures and up to 700 K. A quasi-simultaneous excitation of two eigenmodes of the quartz resonator is able to compensate for frequency drifts due to temperature changes. The necessary electronics, the controlling behavior, and the dual-mode temperature compensation are described. With this improved technique, quantitative in situ temperature-programmed desorption measurements are possible and the quartz crystal microbalance can be used for quantification of thermal desorption spectroscopy measurements with a quadrupole mass spectrometer. This is demonstrated by a study of the retention and release behavior of hydrogen isotopes in fusion-relevant materials. We find that more than 90% of the deuterium implanted into a thin film of beryllium is released during a subsequent temperature ramp up to 500 K.
