RESUMO
In view of their possible application as high temperature solid lubricants, the tribological and thermochemical properties of several organosilica networks were investigated over a range of temperatures between 25 and 580 °C. Organosilica networks, obtained from monomers with terminal and bridging organic groups, were synthesized by a sol-gel process. The influence of carbon content, crosslink density, rotational freedom of incorporated hydrocarbon groups, and network connectivity on the high temperature friction properties of the polymer was studied for condensed materials from silicon alkoxide precursors with terminating organic groups, i.e., methyltrimethoxysilane, propyltrimethoxysilane, diisopropyldimethoxysilane, cyclohexyltrimethoxysilane, phenyltrimethoxysilane and 4-biphenylyltriethoxysilane networks, as well as precursors with organic bridging groups between Si centers, i.e., 1,4-bis(triethoxysilyl)benzene and 4,4'-bis(triethoxysilyl)-1,1'-biphenyl. Pin-on-disc measurements were performed using all selected solid lubricants. It was found that materials obtained from phenyltrimethoxysilane and cyclohexyltrimethoxysilane precursors showed softening above 120 °C and performed best in terms of friction reduction, reaching friction coefficients as low as 0.01. This value is lower than that of graphite films (0.050 ± 0.005), a common bench mark for solid lubricants.
RESUMO
It is generally assumed that the hydrothermal stability of organically modified silica networks is promoted by high monomer connectivity, network flexibility, and the presence of hydrophobic groups in the network. In this study a range of organosilica compositions is synthesized to explore the extent to which these factors play a role in the hydrothermal dissolution of these materials. Compositions were synthesized from hexafunctional organically bridged silsesquioxanes (OR1)3Si-R-Si(OR1)3 (R = -CH2-, -C2H4-, -C6H12-, -C8H16-, -p-C6H4-; R1 = -CH3, -C2H5), tetrafunctional (OEt)2Si(CH3)-C2H4-Si(CH3)(OEt)2 and Si(OEt)4, trifunctional silsesquioxanes R'-Si(OMe)3 (R'=CH3, n-C3H7, cyclo-C6H11, phenyl), and bifunctional Si(i-C3H7)2(OMe)2. The bond strain, connectivity and hydroxyl concentration of all networks were estimated using 29Si cross-polarized magic angle spinning nuclear magnetic resonance and Fourier-transform infrared spectroscopy. The hydrophilicity was characterized by monitoring the water uptake of the materials in moisture treatments with thermogravimetric analysis, differential scanning calorimetry, and Fourier-transform infrared spectroscopy. The resistance of each network against hydrothermal dissolution in a water/1,5-pentanediol mixture at 80 °C and pH 1, 7, and 13 was analyzed with inductively coupled plasma optical emission spectroscopy and X-ray fluorescence. Bond strain appears to significantly increase the tendency to dissolve under hydrothermal conditions. The stabilizing influences of increased connectivity and hydrophobicity were found to be weak.
RESUMO
Atomically defined substrate surfaces are prerequisite for the epitaxial growth of complex oxide thin films. In this protocol, two approaches to obtain such surfaces are described. The first approach is the preparation of single terminated perovskite SrTiO3 (001) and DyScO3 (110) substrates. Wet etching was used to selectively remove one of the two possible surface terminations, while an annealing step was used to increase the smoothness of the surface. The resulting single terminated surfaces allow for the heteroepitaxial growth of perovskite oxide thin films with high crystalline quality and well-defined interfaces between substrate and film. In the second approach, seed layers for epitaxial film growth on arbitrary substrates were created by Langmuir-Blodgett (LB) deposition of nanosheets. As model system Ca2Nb3O10(-) nanosheets were used, prepared by delamination of their layered parent compound HCa2Nb3O10. A key advantage of creating seed layers with nanosheets is that relatively expensive and size-limited single crystalline substrates can be replaced by virtually any substrate material.
