Fabrication of microoptical freeform arrays on wafer level for imaging applications.

Miniaturized imaging systems combining an ultra-compact form factor in combination with the ability of refocusing and depth imaging have gained much interest in the field of mobile imaging. Therefore, artificial compound eye cameras are an extremely promising approach for the realization of compact monolithic camera modules on wafer level. Up to now, their imaging performance was limited to low resolution in the range of VGA format according to fabrication constrains given by the established microoptical fabrication methods, namely the reflow of photoresist. In order to overcome these classical limitations, the use of refractive freeform arrays (RFFA) instead of conventional microlens arrays is inevitable. To enable high volume and cost efficient mass production of artificial compound eye cameras for mass markets like the consumer electronics industry, their fabrication on wafer level is essential, but has not been published up to now. We present a wafer level based process chain enabling the fabrication of these elements for the first time.

Laser lithographic approach to micro-optical freeform elements with extremely large sag heights.

Artificial compound eye cameras are an attractive approach to generate imaging systems of maximum miniaturization. Their thickness can be reduced by a factor of two in comparison to miniaturized single aperture cameras with the same pixel size and resolution. The imaging performance of these systems can be improved significantly by the use of micro-optical refractive freeform arrays (RFFA). Due to the complexity of these non-symmetric surface profiles with sag heights larger than 50 µm in combination with extreme profile accuracies better than λ/14 (rms), there is no dedicated fabrication technology currently available. In the presented research, significant improvements in the fabrication of these elements with laser lithography were reached. Therefore, a laser lithographic process based on several coating steps in combination with a multiple exposure strategy was developed that is suitable for the fabrication of arbitrary freeform structures with sag heights up to 60 µm. In order to minimize surface deviations caused by unavoidable process nonlinearities, a compensation strategy based on an empirical process model is used. The achievable accuracy of the proposed method and its limitations were investigated by fabricating a spherical micro lens array for demonstration. The fabricated elements possess a shape deviation of less than 1.3 µm (rms) and can be used as master structures for a subsequent replication process in order to realize a cost efficient mass production of artificial compound eye optics on wafer level.

Highly efficient three-level blazed grating in the resonance domain.

We designed, fabricated, and characterized three-level transmission gratings in the resonance domain with reduced shadowing losses based on a three-wave interference mechanism. A new technological approach allows for fabrication of homogeneous and large area multilevel gratings without spurious artifacts. To our knowledge, the measured efficiency of 86% exhibits the largest value yet reported for a multilevel transmission grating in the resonance domain close to normal incidence.