Lithium diisopropylamide-mediated ortholithiation of 2-fluoropyridines: rates, mechanisms, and the role of autocatalysis.

Lithium diisopropylamide (LDA)-mediated ortholithiations of 2-fluoropyridine and 2,6-difluoropyridine in tetrahydrofuran at -78 °C were studied using a combination of IR and NMR spectroscopic and computational methods. Rate studies show that a substrate-assisted deaggregation of LDA dimer occurs parallel to an unprecedented tetramer-based pathway. Standard and competitive isotope effects confirm post-rate-limiting proton transfer. Autocatalysis stems from ArLi-catalyzed deaggregation of LDA proceeding via 2:2 LDA-ArLi mixed tetramers. A hypersensitivity of the ortholithiation rates to traces of LiCl derives from LiCl-catalyzed LDA dimer-monomer exchange and a subsequent monomer-based ortholithiation. Fleeting 2:2 LDA-LiCl mixed tetramers are suggested to be key intermediates. The mechanisms of both the uncatalyzed and catalyzed deaggregations are discussed. A general mechanistic paradigm is delineated to explain a number of seemingly disparate LDA-mediated reactions, all of which occur in tetrahydrofuran at -78 °C.

Regioselective lithium diisopropylamide-mediated ortholithiation of 1-chloro-3-(trifluoromethyl)benzene: role of autocatalysis, lithium chloride catalysis, and reversibility.

Ortholithiation of 1-chloro-3-(trifluoromethyl)benzene with lithium diisopropylamide (LDA) in tetrahydrofuran at -78 °C displays characteristics of reactions in which aggregation events are rate limiting. Metalation with lithium-chloride-free LDA involves a rate-limiting deaggregation via dimer-based transition structures. The post-rate-limiting proton transfers are suggested to involve highly solvated triple ions. Autocatalysis by the resulting aryllithiums or catalysis by traces (<100 ppm) of LiCl diverts the reaction through di- and trisolvated monomer-based pathways for metalation at the 2 and 6 positions, respectively. The regiochemistry is dictated by a combination of kinetically controlled metalations overlaid by an equilibration involving diisopropylamine that is shown to occur by the microscopic reverse of the monomer-based metalations.

1,4-addition of lithium diisopropylamide to unsaturated esters: role of rate-limiting deaggregation, autocatalysis, lithium chloride catalysis, and other mixed aggregation effects.

Lithium diisopropylamide (LDA) in tetrahydrofuran at -78 °C undergoes 1,4-addition to an unsaturated ester via a rate-limiting deaggregation of LDA dimer followed by a post-rate-limiting reaction with the substrate. Muted autocatalysis is traced to a lithium enolate-mediated deaggregation of the LDA dimer and the intervention of LDA-lithium enolate mixed aggregates displaying higher reactivities than LDA. Striking accelerations are elicited by <1.0 mol % LiCl. Rate and mechanistic studies have revealed that the uncatalyzed and catalyzed pathways funnel through a common monosolvated-monomer-based intermediate. Four distinct classes of mixed aggregation effects are discussed.

Kinetic Monte Carlo simulations of anisotropic Si(100) etching: Modeling the chemical origins of characteristic etch morphologies.

An atomistic, chemically realistic, kinetic Monte Carlo simulator of anisotropic Si(100) etching was developed. Surface silicon atoms were classified on the basis of their local structure, and all atoms of each class were etched with the same rate. A wide variety of morphologies, including rough, striped, and hillocked, was observed. General reactivity trends were correlated with specific morphological features. The production of long rows of unstrained dihydride species, recently observed in NH(4)F (aq) etching of Si(100), could only be explained by the rapid etching of dihydrides that are adjacent to (strained) monohydrides-so-called "alpha-dihydrides." Some etch kinetics promoted the formation of {111}-microfaceted pyramidal hillocks, similar in structure to those observed experimentally during Si(100) etching. Pyramid formation was intrinsic to the etch kinetics. In contrast with previously postulated mechanisms of pyramid formation, no masking agent (e.g., impurity, gas bubble) was required. Pyramid formation was explained in terms of the slow etch rate of the {111} sides, {110} edges, and the dihydride species that terminated the apex of the pyramid. As a result, slow etching of Si(111) surfaces was a necessary, but insufficient, criterion for microfacet formation on Si(100) surfaces.

Production of highly homogeneous Si(100) surfaces by H2O etching: surface morphology and the role of strain.

The etching of Si(100) surfaces in ultrapure water was studied with a combination of infrared spectroscopy (FTIR) and scanning tunneling microscopy (STM). While the FTIR results show that the initially rough H/Si(100) surface becomes highly homogeneous during etching, a phenomenon generally associated with surface smoothing, STM images reveal that the homogeneity is associated with the formation of well-defined etch hillocks. After many hours of etching, the resulting H-terminated surface is composed of stripes of atomically flat Si(100) terminated by etch hillocks bounded by {111}- and {110}-oriented microfacets. Polarization analysis of the Si-H stretching modes provides strong evidence for uniform dihydride-termination of the flat regions, with the narrow (approximately 25 A) width of these stripes allowing for relaxation of steric strain between neighboring dihydrides. The unusual hill-and-valley etch morphology is attributed to the effects of steric strain on the reactivity of sites on the etched surface.