Thermo-optic tuning of silicon nitride microring resonators with low loss non-volatile [Formula: see text] phase change material.

A new family of phase change material based on antimony has recently been explored for applications in near-IR tunable photonics due to its wide bandgap, manifested as broadband transparency from visible to NIR wavelengths. Here, we characterize [Formula: see text] optically and demonstrate the integration of this phase change material in a silicon nitride platform using a microring resonator that can be thermally tuned using the amorphous and crystalline states of the phase change material, achieving extinction ratios of up to 18 dB in the C-band. We extract the thermo-optic coefficient of the amorphous and crystalline states of the [Formula: see text] to be 3.4 x [Formula: see text] and 0.1 x 10[Formula: see text], respectively. Additionally, we detail the first observation of bi-directional shifting for permanent trimming of a non-volatile switch using continuous wave (CW) laser exposure ([Formula: see text] to 5.1 dBm) with a modulation in effective refractive index ranging from +5.23 x [Formula: see text] to [Formula: see text] x 10[Formula: see text]. This work experimentally verifies optical phase modifications and permanent trimming of [Formula: see text], enabling potential applications such as optically controlled memories and weights for neuromorphic architecture and high density switch matrix using a multi-layer PECVD based photonic integrated circuit.

A Review of Capabilities and Scope for Hybrid Integration Offered by Silicon-Nitride-Based Photonic Integrated Circuits.

In this review we present some of the recent advances in the field of silicon nitride photonic integrated circuits. The review focuses on the material deposition techniques currently available, illustrating the capabilities of each technique. The review then expands on the functionalisation of the platform to achieve nonlinear processing, optical modulation, nonvolatile optical memories and integration with III-V materials to obtain lasing or gain capabilities.

On-chip sub-wavelength Bragg grating design based on novel low loss phase-change materials.

We propose a reconfigurable and non-volatile Bragg grating in the telecommunication C-band based on the combination of novel low-loss phase-change materials (specifically Ge2Sb2Se4Te1 and Sb2S3) with a silicon nitride platform. The Bragg grating is formed by arrayed cells of phase-change material, whose crystallisation fraction modifies the Bragg wavelength and extinction ratio. These devices could be used in integrated photonic circuits for optical communications applications in smart filters and Bragg mirrors and could also find use in tuneable ring resonators, Mach-Zehnder interferometers or frequency selectors for future laser on chip applications. In the case of Ge2Sb2Se4Te1, crystallisation produces a Bragg resonance shift up to ∼ 15 nm, accompanied with a large amplitude modulation (insertion loss of 22 dB). Using Sb2S3, low losses are presented in both states of the phase change material, obtaining a ∼ 7 nm red-shift in the Bragg wavelength. The gratings are evaluated for two period numbers, 100 and 200 periods. The number of periods determines the bandwidth and extinction ratio of the filters. Increasing the number of periods increases the extinction ratio and reflected power, also narrowing the bandwidth. This results in a trade-off between device size and performance. Finally, we combine both phase-change materials in a single Bragg grating to provide both frequency and amplitude modulation. A defect is introduced in the Sb2S3 Bragg grating, producing a high quality factor resonance (Q ∼ 104) which can be shifted by 7 nm via crystallisation. A GSST cell is then placed in the defect which can modulate the transmission amplitude from low loss to below -16 dB.

Tuning silicon-rich nitride microring resonances with graphene capacitors for high-performance computing applications.

We demonstrate the potential of a graphene capacitor structure on silicon-rich nitride micro-ring resonators for multitasking operations within high performance computing. Capacitor structures formed by two graphene sheets separated by a 10 nm insulating silicon nitride layer are considered. Hybrid integrated photonic structures are then designed to exploit the electro-absorptive operation of the graphene capacitor to tuneably control the transmission and attenuation of different wavelengths of light. By tuning the capacitor length, a shift in the resonant wavelength is produced giving rise to a broadband multilevel photonic volatile memory. The advantages of using silicon-rich nitride as the waveguiding material in place of the more conventional silicon nitride (Si3N4) are shown, with a doubling of the device's operational bandwidth from 31.2 to 62.41 GHz achieved while also allowing a smaller device footprint. A systematic evaluation of the device's performance and energy consumption is presented. A difference in the extinction ratio between the ON and OFF states of 16.5 dB and energy consumptions of <0.3 pJ/bit are obtained. Finally, it has been demonstrated that increasing the permittivity of the insulator layer in the capacitor structure, the energy consumption per bit can be reduced even further. Overall, the resonance tuning enabled by the novel graphene capacitor makes it a key component for future multilevel photonic memories and optical routing in high performance computing.