Reflection imaging with a helium zone plate microscope.

Neutral helium atom microscopy is a novel microscopy technique which offers strictly surface-sensitive, non-destructive imaging. Several experiments have been published in recent years where images are obtained by scanning a helium beam spot across a surface and recording the variation in scattered intensity at a fixed total scattering angle θSD and fixed incident angle θi relative to the overall surface normal. These experiments used a spot obtained by collimating the beam (referred to as helium pinhole microscopy). Alternatively, a beam spot can be created by focusing the beam with an atom optical element. However up till now imaging with a focused helium beam has only been demonstrated in transmission (using a zone plate). Here we present the first reflection images obtained with a focused helium beam (also using a zone plate). Images are obtained with a spot size (FWHM) down to 4.7µm±0.5µm, and we demonstrate focusing down to a spot size of about 1µm. Furthermore, we present experiments measuring the scattering distribution from a focused helium beam spot. The experiments are done by varying the incoming beam angle θi while keeping the beam-detector angle θSD and the point where the beam spot hits the surface fixed - in essence, a microscopy scale realization of a standard helium atom scattering experiment. Our experiments are done using an electron bombardment detector with adjustable signal accumulation, developed particularly for helium microscopy.

Experimental and theoretical investigation of waveguided plasmonic surface lattice resonances.

Plasmonic nanostructures are good candidates for refractive index sensing applications through the surface plasmon resonance due to their strong dependence on the surrounding dielectric media. However, typically low quality-factor limits their application in sensing devices. To improve the quality-factor, we have experimentally and theoretically investigated two-dimensional gold nanoparticle gratings situated on top of a waveguide. The coupling between the localized surface plasmon and waveguide modes results in Fano-type resonances, with high quality-factors, very similar to plasmonic surface lattice resonances. By combining plasmonic surface lattice resonance and waveguide theory, we present a theoretical framework describing the structures. By immersing the fabricated samples in three different media we find a sensitivity of ∼50 nm/RIU and figure of merit of 8.9, and demonstrate good agreement with the theory presented. Further analysis show that the sensitivity is very dependent on the waveguide parameters, grating constant and the dielectric environment, and by tuning these parameters we obtain a theoretical sensitivity of 887 nm/RIU.

Exploring proximity effects and large depth of field in helium ion beam lithography: large-area dense patterns and tilted surface exposure.

Helium ion beam lithography (HIL) is an emerging nanofabrication technique. It benefits from a reduced interaction volume compared to that of an electron beam of similar energy, and hence reduced long-range scattering (proximity effect), higher resist sensitivity and potentially higher resolution. Furthermore, the small angular spread of the helium ion beam gives rise to a large depth of field. This should enable patterning on tilted and curved surfaces without the need of any additional adjustments, such as laser-auto focus. So far, most work on HIL has been focused on exploiting the reduced proximity effect to reach single-digit nanometer resolution, and has thus been concentrated on single-pixel exposures over small areas. Here we explore two new areas of application. Firstly, we investigate the proximity effect in large-area exposures and demonstrate HIL's capabilities in fabricating precise high-density gratings on large planar surfaces (100 µm × 100 µm, with pitch down to 35 nm) using an area dose for exposure. Secondly, we exploit the large depth of field by making the first HIL patterns on tilted surfaces (sample stage tilted 45°). We demonstrate a depth of field greater than 100 µm for a resolution of about 20 nm.