Electron-resist fabrication of bends and couplers for integrated optical circuits.

The fabrication of complex integrated optical circuits using thin films will require dielectric patterns of high resolution and edge smoothness. This paper describes an electron-beam technique that has been used to form a curved thin-film light guide and a directional coupler, and is applicable to filters and other more complex components.

Barium silicate films for integrated optical circuits.

This paper describes the preparation and properties of rf sputtered barium silicate films that are suitable for use as transmission media in integrated optical circuits. It is shown that the films, which can be produced with a wide range of refractive indices by suitable selection of the ratio of the target constituents, exhibit low optical attenuation. The techniques used to deposit the films and the effect on loss of a number of parameters including pressure, film thickness, and substrate bias are discussed.

Effect of refractive index gradients on index measurement by the abeles method.

Abeles's method of determining the refractive index of a thin film is discussed. Attention is directed to the effect of a graded index transition between the film and the substrate on the measured index. First, a closed-form analysis of the problem for a long transition region is given. This is followed by a computer analysis applicable to transition regions of any length.