Enhancing the Microparticle Deposition Stability and Homogeneity on Planer for Synthesis of Self-Assembly Monolayer.

The deposition stability and homogeneity of microparticles improved with mask, lengthened nozzle and flow rate adjustment. The microparticles can be used to encapsulate monomers, before the monomers in the microparticles can be deposited onto a substrate for nanoscale self-assembly. For the uniformity of the synthesized nanofilm, the homogeneity of the deposited microparticles becomes an important issue. Based on the ANSYS simulation results, the effects of secondary flow were minimized with a lengthened nozzle. The ANSYS simulation was also used to investigate the ring-vortex generation and why the ring vortex can be eliminated by adding a mask with an aperture between the nozzle and deposition substrate. The experimental results also showed that particle deposition with a lengthened nozzle was more stable, while adding the mask stabilized deposition and diminished the ring-vortex contamination. The effects of flow rate and pressure were also investigated. Hence, the deposition stability and homogeneity of microparticles was improved.

Using Micro-Molding and Stamping to Fabricate Conductive Polydimethylsiloxane-Based Flexible High-Sensitivity Strain Gauges.

In this study, polydimethylsiloxane (PDMS) and conductive carbon nanoparticles were combined to fabricate a conductive elastomer PDMS (CPDMS). A high sensitive and flexible CPDMS strain sensor is fabricated by using stamping-process based micro patterning. Compared with conventional sensors, flexible strain sensors are more suitable for medical applications but are usually fabricated by photolithography, which suffers from a large number of steps and difficult mass production. Hence, we fabricated flexible strain sensors using a stamping-process with fewer processes than photolithography. The piezoresistive coefficient and sensitivity of the flexible strain sensor were improved by sensor pattern design and thickness change. Micro-patterning is used to fabricate various CPDMS microstructure patterns. The effect of gauge pattern was evaluated with ANSYS simulations. The piezoresistance of the strain gauges was measured and the gauge factor determined. Experimental results show that the piezoresistive coefficient of CPDMS is approximately linear. Gauge factor measurement results show that the gauge factor of a 140.0 µm thick strain gauge with five grids is the highest.