1.
Chem Commun (Camb)
; 51(86): 15692-5, 2015 Nov 07.
Artigo
em Inglês
| MEDLINE
| ID: mdl-26365629
RESUMO
We demonstrate the impact of reducing agents for Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD) of WS2 from WF6 and H2S precursors. Nanocrystalline WS2 layers with a two-dimensional structure can be obtained at low deposition temperatures (300-450 °C) without using a template or anneal.
2.
Fortschr Kieferorthop
; 47(3): 200-11, 1986 Jun.
Artigo
em Alemão
| MEDLINE
| ID: mdl-3462108
