High-Throughput Open-Air Plasma Activation of Metal-Oxide Thin Films with Low Thermal Budget.

Sputter-processed oxide films are typically annealed at high temperature (activation process) to achieve stable electrical characteristics through the formation of strong metal-oxide chemical bonds. For instance, indium-gallium-zinc oxide (IGZO) films typically need a thermal treatment at 300 °C for ≥1 h as an activation process. We propose an open-air plasma treatment (OPT) to rapidly and effectively activate sputter-processed IGZO films. The OPT effectively induces metal-oxide chemical bonds in IGZO films at temperatures as low as 240 °C, with a dwell time on the order of a second. Furthermore, by controlling the plasma-processing conditions (scan speed, distance a between plasma nozzle and samples, and gas flow rate), the electrical characteristics and the microstructure of the IGZO films can be easily tuned. Finally, OPT can be utilized to implement a selective activation process. Plasma-treated IGZO thin-film transistors (TFTs) exhibit comparable electrical characteristics to those of conventionally thermal treated IGZO TFTs. Through in-depth optical, chemical, and physical characterizations, we confirm that OPT simultaneously dissociates weak chemical bonds by UV radiation and ion bombardment and re-establishes the metal-oxide network by radical reaction and OPT-induced heat.

Open-air spray plasma deposited UV-absorbing nanocomposite coatings.

We demonstrate the deposition of mechanically robust UV-absorbing nanocomposite coatings with a newly developed dual-source deposition method involving ultrasonic spraying and open-air plasma deposition. Nanoparticles and the coating matrix are independently deposited which eliminates difficulties associated with preparing composites with high mass fraction of well-dispersed nanoparticles in the matrix. Nanocomposite coatings containing different concentrations of silica, ceria, and both titania and ceria nanoparticles were successfully deposited with good nanoparticle dispersity, high transparency over the visible range, effective absorption in the UV wavelength, and enhanced mechanical properties. Moreover, films were successfully deposited on several substrates including polycarbonate to demonstrate the low processing temperature of this dual-source deposition method. Coatings with different nanoparticle concentrations and film thicknesses were systematically studied in terms of their surface morphology, optical properties and mechanical properties. Accelerated photostability testing of the UV-absorbing nanocomposites demonstrates significantly enhanced performance compared to existing coatings with either a polymeric matrix or organic UV-absorbers.

Efficient Flame Retardant Thin Films Synthesized by Atmospheric Pressure PECVD through the High Co-deposition Rate of Hexamethyldisiloxane and Triethylphosphate on Polycarbonate and Polyamide-6 Substrates.

An innovative approach to produce high-performance and halogen-free flame-retardant thin films at atmospheric pressure is reported. PDMS-based coatings with embedded dopant-rich polyphosphates are elaborated thanks to a straightforward approach, using an atmospheric pressure dielectric barrier discharge (AP-DBD). Deposition conditions have been tailored to elaborate various thin films that can match the fire performance requirements. Morphology, chemical composition, and structure are investigated, and results show that the coatings performances are increased by taking advantage of the synergistic effect of P and Si flame retardant compounds. More specifically, this study relates the possibility to obtain flame retardant properties on PolyCarbonate and PolyAmide-6 thanks to their covering by a 5 µm thick coating, i.e. very thin films for this field of application, yet quite substantial for plasma processes. Hence, this approach enables deposition of flame retardant coatings onto different polymer substrates, providing a versatile fireproofing solution for different natures of polymer substrates. The presence of an expanded charred layer at the surface acts as a protective barrier limiting heat and mass transfer. This latter retains and consumes a part of the PC or PA-6 degradation byproducts and then minimizes the released flammable gases. It may also insulate the substrate from the flame and limit mass transfers of remaining volatile gases. Moreover, reactions in the condensed phase have also been highlighted despite the relatively thin thickness of the deposited layers. As a result of these phenomena, excellent performances are obtained, illustrated by a decrease of the peak of the heat release rate (pHRR) and an increase of the time to ignition (TTI).

Atmospheric pressure plasma-initiated chemical vapor deposition (AP-PiCVD) of poly(diethylallylphosphate) coating: a char-forming protective coating for cellulosic textile.

An innovative atmospheric pressure chemical vapor deposition method toward the deposition of polymeric layers has been developed. This latter involves the use of a nanopulsed plasma discharge to initiate the free-radical polymerization of an allyl monomer containing phosphorus (diethylallylphosphate, DEAP) at atmospheric pressure. The polymeric structure of the film is evidence by mass spectrometry. The method, highly suitable for the treatment of natural biopolymer substrate, has been carried out on cotton textile to perform the deposition of an efficient and conformal protective coating.