1.
Nanotechnology
; 31(36): 365702, 2020 Sep 04.
Artigo
em Inglês
| MEDLINE
| ID: mdl-32442986
RESUMO
With additional precursor soaking, a thin Al2O3 dielectric layer can be grown on mono-layer MoS2 by using atomic layer deposition (ALD). Similar optical characteristics are observed before and after ALD growth for the mono-layer MoS2, which indicates that minor damage to the thin 2D material film is introduced during the growth procedure. With the thin separation layer, luminescence enhancement and dual-color emission are observed by transferring MoS2 and WS2 mono-layer 2D materials to 5 nm Al2O3/mono-layer MoS2 samples, respectively. The results demonstrate that with careful treatment of the interfaces of 2D crystals with other materials, different stacked structures can be established.