Anti-reflective coating with a conductive indium tin oxide layer on flexible glass substrates.

Flexible glass has many applications including photovoltaics, organic light-emitting device (OLED) lighting, and displays. Its ability to be processed in a roll-to-roll facility enables high-throughput continuous manufacturing compared to conventional glass processing. For photovoltaic, OLED lighting, and display applications, transparent conductors are required with minimal optical reflection losses. Here, we demonstrate an anti-reflective coating (ARC) that incorporates a useful transparent conductor that is realizable on flexible substrates. This reduces the average reflectivity to less than 6% over the visible band from normal incidence to incident angles up to 60°. This ARC is designed by the average uniform algorithm method. The coating materials consist of a multilayer stack of an electrically functional conductive indium tin oxide with conductivity 2.95×105 Siemens/m (31 Ω/□), and AlSiO2. The coatings showed modest changes in reflectivity and no delamination after 10,000 bending cycles. This demonstrates that effective conductive layers can be integrated into ARCs and can be realized on flexible glass substrates with proper design and process control.

An indium tin oxide-free polymer solar cell on flexible glass.

Future optoelectronic devices and their low-cost roll-to-roll production require mechanically flexible transparent electrodes (TEs) and substrate materials. Indium tin oxide (ITO) is the most widely used TE because of its high optical transmission and low electrical sheet resistance. However, ITO, besides being expensive, has very poor performance under mechanical stress because of its fragile oxide nature. Alternative TE materials have thus been sought. Here we report the development of a multilayer TiO2/Ag/Al-doped ZnO TE structure and an ITO-free polymer solar cell (PSC) incorporating it. Electro-optical performances close to those of ITO can be achieved for the proposed TE and corresponding PSC with an additional advantage in their mechanical flexibility, as demonstrated by the fact that the cell efficiency maintains 94% of its initial value (6.6%) after 400 cycles of bending, with 6 and 3 cm maximum and minimum radii, respectively. Instead of common plastic materials, our work uses a very thin (0.14 mm) flexible glass substrate with several benefits, such as the possibility of high-temperature processes, superior antipermeation properties against oxygen and moisture, and improved film adhesion.

Straining nanomembranes via highly mismatched heteroepitaxial growth: InAs islands on compliant Si substrates.

Freestanding, edge-supported silicon nanomembranes are defined by selective underetching of patterned silicon-on-insulator substrates. The membranes are afterward introduced into a molecular beam epitaxy chamber and overgrown with InAs, resulting in the formation of InAs islands on flat areas and at the top of the Si nanomembranes. A detailed analysis of sample morphology, island structure, and strain is carried out. Scanning electron microscopy shows that the membrane stays intact during overgrowth. Atomic force microscopy reveals a lower island density on top of the freestanding membranes, denoting a modified wetting or diffusivity in these areas. An observed bending of the membrane indicates a strain transfer from the InAs islands to the compliant substrate. X-ray diffraction and finite-element modeling indicate a nonuniform strain state of the island ensemble grown on the freestanding membrane. A simulation of the bending of the nanomembranes indicates that the islands at the center of the freestanding area are highly strained, whereas islands on the border tend to be fully relaxed. Finally, continuum elasticity calculations suggest that for a sufficiently thin membrane InAs could transfer enough strain to the membrane to allow coherent epitaxial growth, something not possible on bulk substrates.

Influence of surface properties on the electrical conductivity of silicon nanomembranes.

Because of the large surface-to-volume ratio, the conductivity of semiconductor nanostructures is very sensitive to surface chemical and structural conditions. Two surface modifications, vacuum hydrogenation (VH) and hydrofluoric acid (HF) cleaning, of silicon nanomembranes (SiNMs) that nominally have the same effect, the hydrogen termination of the surface, are compared. The sheet resistance of the SiNMs, measured by the van der Pauw method, shows that HF etching produces at least an order of magnitude larger drop in sheet resistance than that caused by VH treatment, relative to the very high sheet resistance of samples terminated with native oxide. Re-oxidation rates after these treatments also differ. X-ray photoelectron spectroscopy measurements are consistent with the electrical-conductivity results. We pinpoint the likely cause of the differences.PACS: 73.63.-b, 62.23.Kn, 73.40.Ty.

Semiconductor nanomembrane tubes: three-dimensional confinement for controlled neurite outgrowth.

In many neural culture studies, neurite migration on a flat, open surface does not reflect the three-dimensional (3D) microenvironment in vivo. With that in mind, we fabricated arrays of semiconductor tubes using strained silicon (Si) and germanium (Ge) nanomembranes and employed them as a cell culture substrate for primary cortical neurons. Our experiments show that the SiGe substrate and the tube fabrication process are biologically viable for neuron cells. We also observe that neurons are attracted by the tube topography, even in the absence of adhesion factors, and can be guided to pass through the tubes during outgrowth. Coupled with selective seeding of individual neurons close to the tube opening, growth within a tube can be limited to a single axon. Furthermore, the tube feature resembles the natural myelin, both physically and electrically, and it is possible to control the tube diameter to be close to that of an axon, providing a confined 3D contact with the axon membrane and potentially insulating it from the extracellular solution.

Nanomechanical architecture of semiconductor nanomembranes.

Semiconductor nanomembranes are single-crystal sheets with thickness ranging from 5 to 500nm. They are flexible, bondable, and mechanically ultra-compliant. They present a new platform to combine bottom-up and top-down semiconductor processing to fabricate various three-dimensional (3D) nanomechanical architectures, with an unprecedented level of control. The bottom-up part is the self-assembly, via folding, rolling, bending, curling, or other forms of shape change of the nanomembranes, with top-down patterning providing the starting point for these processes. The self-assembly to form 3D structures is driven by elastic strain relaxation. A variety of structures, including tubes, rings, coils, rolled-up "rugs", and periodic wrinkles, has been made by such self-assembly. Their geometry and unique properties suggest many potential applications. In this review, we describe the design of desired nanostructures based on continuum mechanics modelling, definition and fabrication of 2D strained nanomembranes according to the established design, and release of the 2D strained sheet into a 3D or quasi-3D object. We also describe several materials properties of nanomechanical architectures. We discuss potential applications of nanomembrane technology to implement simple and hybrid functionalities.

Integrated freestanding single-crystal silicon nanowires: conductivity and surface treatment.

Integrated freestanding single-crystal silicon nanowires with typical dimension of 100 nm × 100 nm × 5 µm are fabricated by conventional 1:1 optical lithography and wet chemical silicon etching. The fabrication procedure can lead to wafer-scale integration of silicon nanowires in arrays. The measured electrical transport characteristics of the silicon nanowires covered with/without SiO(2) support a model of Fermi level pinning near the conduction band. The I-V curves of the nanowires reveal a current carrier polarity reversal depending on Si-SiO(2) and Si-H bonds on the nanowire surfaces.

Mechano-electronic superlattices in silicon nanoribbons.

Significant new mechanical and electronic phenomena can arise in single-crystal semiconductors when their thickness reaches nanometer dimensions, where the two surfaces of the crystal are physically close enough to each other that what happens at one surface influences what happens at the other. We show experimentally that, in silicon nanomembranes, through-membrane elastic interactions cause the double-sided ordering of epitaxially grown nanostressors that locally and periodically highly strains the membrane, leading to a strain lattice. Because strain influences band structure, we create a periodic band gap modulation, up to 20% of the band gap, effectively an electronic superlattice. Our calculations demonstrate that discrete minibands can form in the potential wells of an electronic superlattice generated by Ge nanostressors on a sufficiently thin Si(001) nanomembrane at the temperature of 77 K. We predict that it is possible to observe discrete minibands in Si nanoribbons at room temperature if nanostressors of a different material are grown.

Mechanism for nanotube formation from self-bending nanofilms driven by atomic-scale surface-stress imbalance.

We demonstrate, by theoretical analysis and molecular dynamics simulation, a mechanism for fabricating nanotubes by self-bending of nanofilms under intrinsic surface-stress imbalance due to surface reconstruction. A freestanding Si nanofilm may spontaneously bend itself into a nanotube without external stress load, and a bilayer SiGe nanofilm may bend into a nanotube with Ge as the inner layer, opposite of the normal bending configuration defined by misfit strain. Such rolled-up nanotubes can accommodate a high level of strain, even beyond the magnitude of lattice mismatch, greatly modifying the tube electronic and optoelectronic properties.

Seeing the atomic orbital: first-principles study of the effect of tip termination on atomic force microscopy.

We perform extensive first-principles calculations to simulate the topographical atomic-force-microscope image of an adatom on the Si(111)-(7 x 7) surface, demonstrating the feasibility of imaging not only the atoms but also the atomic orbitals. Our comparative study of tip terminations shows that two subatomic features can appear for a single adatom when it is imaged by a Si(001)-type tip having two dangling bonds on its apex, while only one feature would appear if it were imaged by a Si(111)-type tip having one dangling bond on the apex. The key condition for seeing the atomic orbitals is to bring the tip so close to the surface that the angular-dependent force dominates the tip-surface interaction.

Nanostressors and the nanomechanical response of a thin silicon film on an insulator.

Pseudomorphic three-dimensional Ge nanocrystals (quantum dots) grown on thin silicon-on-insulator substrates can induce significant bending of the silicon template layer that is local on the nanometer scale. We use molecular dynamics simulations and analytical models to confirm the local bending of the Si template and to show that its magnitude approaches the maximum value for a freestanding membrane. The requisite greatly enhanced viscous flow of SiO2 underneath the Si layer is consistent with the dependence of the viscosity of SiO2 on shear stress.