Unique Hyperspectral Response Design Enabled by Periodic Surface Textures in Photodiodes.

The applications of hyperspectral imaging across disciplines such as healthcare, automobiles, forensics, and astronomy are constrained by the requirement for intricate filters and dispersion lenses. By utilization of devices with engineered spectral responses and advanced signal processing techniques, the spectral imaging process can be made more approachable across various fields. We propose a spectral response design method employing photon-trapping surface textures (PTSTs), which eliminates the necessity for external diffraction optics and facilitates system miniaturization. We have developed an analytical model to calculate electromagnetic wave coupling using the effective refractive index of silicon in the presence of PTST. We have extensively validated the model against simulations and experimental data, ensuring the accuracy of our predictions. We observe a strong linear relationship between the peak coupling wavelength and the PTST period along with a moderate proportional relation to the PTST diameters. Additionally, we identify a significant correlation between inter-PTST spacing and wave propagation modes. The experimental validation of the model is conducted using PTST-equipped photodiodes fabricated through complementary metal-oxide-semiconductor-compatible processes. Further, we demonstrate the electrical and optical performance of these PTST-equipped photodiodes to show high speed (response time: 27 ps), high gain (multiplication gain, M: 90), and a low operating voltage (breakdown voltage: ∼ 8.0 V). Last, we utilize the distinctive response of the fabricated PTST-equipped photodiode to simulate hyperspectral imaging, providing a proof of principle. These findings are crucial for the progression of on-chip integration of high-performance spectrometers, guaranteeing real-time data manipulation, and cost-effective production of hyperspectral imaging systems.

Unique Hyperspectral Response Design in High-Speed Photodetectors Enabled by Periodic Surface Textures.

Engineered spectral response in photodetectors combined with advanced signal processing and deep learning-based image reconstruction enables widespread applications of hyperspectral imaging. These advancements in spectral imaging eliminate the need for complex filters and dispersion lenses, benefiting various fields such as remote sensing, astronomy, agriculture, healthcare, forensics, food quality assessment, environmental monitoring, and cultural heritage preservation. We present a spectral response design method using photon-trapping surface textures (PTSTs) to enable system miniaturization by eliminating the need for external diffraction optics and employing detector-only spectral sensors. We additionally demonstrate the fabrication of cost-effective, high-performance silicon photodetectors with unique spectral responses by integrating PTSTs. These CMOS-compatible photodetectors are ultra-fast, highly sensitive, and suitable for wideband multi/hyperspectral imaging systems. Our investigation uncovers a prominent linear correlation between the PTST periods and the peak coupling wavelengths while observing a weaker relationship with the PTST diameters. Furthermore, we establish a significant association between inter-PTST spacing and wave propagation patterns. In a proof-of-principle demonstration, we effectively employ these photodetectors with distinct spectral responses to capture visible and near-infrared wavelengths for multispectral imaging. These findings support the feasibility of integrating high-performance on-chip spectrometers, offering compact form factors, extensive applicability, and real-time data acquisition and manipulation capabilities.

Design and Fabrication of High-Efficiency, Low-Power, and Low-Leakage Si-Avalanche Photodiodes for Low-Light Sensing.

Since the advent of impact ionization and its application in avalanche photodiodes (APD), numerous application goals have contributed to steady improvements over several decades. The characteristic high operating voltages and the need for thick absorber layers (π-layers) in the Si-APDs pose complicated design and operational challenges in complementary metal oxide semiconductor integration of APDs. In this work, we have designed a sub-10 V operable Si-APD and epitaxially grown the stack on a semiconductor-on-insulator substrate with a submicron thin π-layer, and we fabricated the devices with integrated photon-trapping microholes (PTMH) to enhance photon absorption. The fabricated APDs show a substantially low prebreakdown leakage current density of ∼50 nA/mm2. The devices exhibit a consistent ∼8.0 V breakdown voltage with a multiplication gain of 296.2 under 850 nm illumination wavelength. We report a ∼5× increase in the EQE at 850 nm by introducing the PTMH into the device. The enhancement in the EQE is evenly distributed across the entire wavelength range (640-1100 nm). The EQE of the devices without PTMH (flat devices) undergo a notable oscillation caused by the resonance at specific wavelengths and show a strong dependency on the angle of incidence. This characteristic dependency is significantly circumvented by introducing the PTMH into the APD. The devices exhibit a significantly low off-state power consumption of 0.41 µW/mm2 and stand fairly well against the state-of-the-art literature. Such high efficiency, low leakage, low breakdown voltage, and extremely low-power Si-APD can be easily incorporated into the existing CMOS foundry line and enable on-chip, high-speed, and low-photon count detection on a large scale.

Improvement of Schottky Contacts of Gallium Oxide (Ga2O3) Nanowires for UV Applications.

Interest in the synthesis and fabrication of gallium oxide (Ga2O3) nanostructures as wide bandgap semiconductor-based ultraviolet (UV) photodetectors has recently increased due to their importance in cases of deep-UV photodetectors operating in high power/temperature conditions. Due to their unique properties, i.e., higher surface-to-volume ratio and quantum effects, these nanostructures can significantly enhance the sensitivity of detection. In this work, two Ga2O3 nanostructured films with different nanowire densities and sizes obtained by thermal oxidation of Ga on quartz, in the presence and absence of Ag catalyst, were investigated. The electrical properties influenced by the density of Ga2O3 nanowires (NWs) were analyzed to define the configuration of UV detection. The electrical measurements were performed on two different electric contacts and were located at distances of 1 and 3 mm. Factors affecting the detection performance of Ga2O3 NWs film, such as the distance between metal contacts (1 and 3 mm apart), voltages (5-20 V) and transient photocurrents were discussed in relation to the composition and nanostructure of the Ga2O3 NWs film.

Gallium oxide nanowires for UV detection with enhanced growth and material properties.

In the last decade, interest in the use of beta gallium oxide (ß-Ga2O3) as a semiconductor for high power/high temperature devices and deep-UV sensors has grown. Ga2O3 has an enormous band gap of 4.8 eV, which makes it well suited for these applications. Compared to thin films, nanowires exhibit a higher surface-to-volume ratio, increasing their sensitivity for detection of chemical substances and light. In this work, we explore a simple and inexpensive method of growing high-density gallium oxide nanowires at high temperatures. Gallium oxide nanowire growth can be achieved by heating and oxidizing pure gallium at high temperatures (~ 1000 °C) in the presence of trace amounts of oxygen. This process can be optimized to large-scale production to grow high-quality, dense and long Ga2O3 nanowires. We show the results of morphological, structural, electrical and optical characterization of the ß-Ga2O3 nanowires including the optical bandgap and photoconductance. The influence of density on these Ga2O3 nanowires and their properties will be examined in order to determine the optimum configuration for the detection of UV light.

Influence of Silver as a Catalyst on the Growth of ß-Ga2O3 Nanowires on GaAs.

A simple and inexpensive thermal oxidation process was performed to synthesize gallium oxide (Ga2O3) nanowires using Ag thin film as a catalyst at 800 °C and 1000 °C to understand the effect of the silver catalyst on the nanowire growth. The effect of doping and orientation of the substrates on the growth of Ga2O3 nanowires on single-crystal gallium arsenide (GaAs) wafers in atmosphere were investigated. A comprehensive study of the oxide film and nanowire growth was performed using various characterization techniques including XRD, SEM, EDS, focused ion beam (FIB), XPS and STEM. Based on the characterization results, we believe that Ag thin film produces Ag nanoparticles at high temperatures and enhances the reaction between oxygen and gallium, contributing to denser and longer Ga2O3 nanowires compared to those grown without silver catalyst. This process can be optimized for large-scale production of high-quality, dense, and long nanowires.

Comparative Study of Growth Morphologies of Ga2O3 Nanowires on Different Substrates.

Gallium oxide (Ga2O3) is a new wide bandgap semiconductor with remarkable properties that offers strong potential for applications in power electronics, optoelectronics, and devices for extreme conditions. In this work, we explore the morphology of Ga2O3 nanostructures on different substrates and temperatures. We used silver catalysts to enhance the growth of Ga2O3 nanowires on substrates such as p-Si substrate doped with boron, 250 nm SiO2 on n-Si, 250 nm Si3N4 on p-Si, quartz, and n-Si substrates by using a thermal oxidation technique at high temperatures (~1000 °C) in the presence of liquid silver paste that served as a catalyst layer. We present the results of the morphological, structural, and elemental characterization of the Ga2O3 nanostructures. This work offers in-depth explanation of the dense, thin, and long Ga2O3 nanowire growth directly on the surfaces of various types of substrates using silver catalysts.

The Growth of Ga2O3 Nanowires on Silicon for Ultraviolet Photodetector.

We investigated the effect of silver catalysts to enhance the growth of Ga2O3 nanowires. The growth of Ga2O3 nanowires on a P+-Si (100) substrate was demonstrated by using a thermal oxidation technique at high temperatures (~1000 °C) in the presence of a thin silver film that serves as a catalyst layer. We present the results of morphological, compositional, and electrical characterization of the Ga2O3 nanowires, including the measurements on photoconductance and transient time. Our results show that highly oriented, dense and long Ga2O3 nanowires can be grown directly on the surface of silicon. The Ga2O3 nanowires, with their inherent n-type characteristics formed a pn heterojunction when grown on silicon. The heterojunction showed rectifying characteristics and excellent UV photoresponse.

Dynamics Contributions to the Growth Mechanism of Ga2O3 Thin Film and NWs Enabled by Ag Catalyst.

In the last few years, interest in the use of gallium oxide (Ga2O3) as a semiconductor for high power/high temperature devices and UV nano-sensors has grown. Ga2O3 has an enormous band gap of 4.8 eV, which makes it well suited for applications in harsh environments. In this work, we explored the effect of Ag thin film as a catalyst to grow gallium oxide. The growth of gallium oxide thin film and nanowires can be achieved by heating and oxidizing pure gallium at high temperatures (~1000 °C) in the presence of trace amounts of oxygen. We present the results of structural, morphological, and elemental characterization of the ß-Ga2O3 thin film and nanowires. In addition, we explore and compare the sensing properties of the ß-Ga2O3 thin film and nanowires for UV detection. The proposed process can be optimized to a high scale production Ga2O3 nanocrystalline thin film and nanowires. By using Ag thin film as a catalyst, we can control the growth parameters to obtain either nanocrystalline thin film or nanowires.

Bridged oxide nanowire device fabrication using single step metal catalyst free thermal evaporation.

In this study, indium-tin-zinc-oxide (ITZO) and Zn doped In2O3 nanowires were directly grown as bridged nanowires between two heavily doped silicon (Si) electrodes on an SOI wafer using single step vapor-solid-solid (VSS) growth method. SEM analysis showed highly dense and self aligned nanowire formation between the Si electrodes. Electrical and UV response measurements were performed in ambient condition. Current-voltage characteristics of devices exhibited both linear and non-linear behavior. This was the first demonstration of bridged ITZO and Zn-doped In2O3 nanowires. Our results show that bridged nanowire growth technique can be a potential candidate for high performance electronic and optoelectronic devices.

Phenomenological Model of the Growth of Ultrasmooth Silver Thin Films Deposited with a Germanium Nucleation Layer.

The structural properties of optically thin (15 nm) silver (Ag) films deposited on SiO2/Si(100) substrates with a germanium (Ge) nucleation layer were studied. The morphological and crystallographical characteristics of Ag thin films with different Ge nucleation layer thicknesses were assessed by cross-sectional transmission electron microscopy (XTEM), reflection high-energy electron diffraction (RHEED), X-ray diffractometry (XRD), grazing incidence X-ray diffractometry (GIXRD), X-ray reflection (XRR), and Fourier transform infrared spectroscopy (FTIR). The surface roughness of Ag thin films was found to decrease significantly by inserting a Ge nucleation layer with a thickness in the range of 1 to 2 nm (i.e., smoothing mode). However, as the Ge nucleation layer thickness increased beyond 2 nm, the surface roughness increased concomitantly (i.e., roughing mode). For the smoothing mode, the role of the Ge nucleation layer in the Ag film deposition is discussed by invoking the surface energy of Ge, the bond dissociation energy of Ag-Ge, and the deposition mechanisms of Ag thin films on a given characteristic Ge nucleation layer. Additionally, Ge island formation, the precipitation of Ge from Ag-Ge alloys, and the penetration of Ge into SiO2 are suggested for the roughing mode. This demonstration of ultrasmooth Ag thin films would offer an advantageous material platform with scalability for applications such as optics, plasmonics, and photonics.

High purcell factor due to coupling of a single emitter to a dielectric slot waveguide.

We demonstrate an all-dielectric quantum electrodynamical nanowire-slab system with a single emitter that concentrates the extremely intense light at the scale of 10 × 75 nm(2). The quantum dot exhibits a record high 31-fold spontaneous decay rate enhancement, its optical saturation and blinking are strongly suppressed, and 80% of emission couples into a waveguide mode.

Long minority carrier diffusion lengths in bridged silicon nanowires.

Nanowires have large surface areas that create new challenges for their optoelectronic applications. Lithographic processes involved in device fabrication and substrate interfaces can lead to surface defects and substantially reduce charge carrier lifetimes and diffusion lengths. Here, we show that using a bridging method to suspend pristine nanowires allows for circumventing detrimental fabrication steps and interfacial effects associated with planar device architectures. We report electron diffusion lengths up to 2.7 µm in bridged silicon nanowire devices, much longer than previously reported values for silicon nanowires with a diameter of 100 nm. Strikingly, electron diffusion lengths are reduced to only 45 nm in planar devices incorporating nanowires grown under the same conditions. The highly scalable silicon nanobridge devices with the demonstrated long diffusion lengths may find exciting applications in photovoltaics, sensing, and photodetectors.

3D-transistor array based on horizontally suspended silicon nano-bridges grown via a bottom-up technique.

Integrated surround-gate field-effect-transistors enabled by bottom-up synthesis of nano-bridges are demonstrated. Horizontally oriented silicon nano-bridge devices are fabricated avoiding the rigorous processes for aligning and contacting nanowires grown via a bottom-up technique. Evaluation of electrical properties and a memory device application of the transistors are presented.

Ultralow-voltage field-ionization discharge on whiskered silicon nanowires for gas-sensing applications.

Several hundred million volts per centimetre of electric-field strength are required to field-ionize gas species. Such fields are produced on sharp metallic tips under a bias of a few kilovolts. Here, we show that field ionization is possible at dramatically lower fields on semiconductor nanomaterials containing surface states, particularly with metal-catalysed whiskers grown on silicon nanowires. The low-voltage field-ionization phenomena observed here cannot be explained solely on the basis of the large field-amplification effect of suspended gold nanoparticles present on the whisker tips. We postulate that field penetration causes upward band-bending at the surface of exposed silicon containing surface states in the vicinity of the catalyst. Band-bending enables the valence electron to tunnel into the surface states at reduced fields. This work provides a basis for development of low-voltage ionization sensors. Although demonstrated on silicon, low-voltage field ionization can be detected on any sharp semiconductor tip containing proper surface states.

Ultrasmooth silver thin films deposited with a germanium nucleation layer.

We demonstrate an effective method for depositing smooth silver (Ag) films on SiO(2)/Si(100) substrates using a thin seed layer of evaporated germanium (Ge). The deposited Ag films exhibit smaller root-mean-square surface roughness, narrower peak-to-valley surface topological height distribution, smaller grain-size distribution, and smaller sheet resistance in comparison to those of Ag films directly deposited on SiO(2)/Si(100) substrates. Optically thin ( approximately 10-20 nm) Ag films deposited with approximately 1-2 nm Ge nucleation layers show more than an order of magnitude improvement in the surface roughness. The presence of the thin layer of Ge changes the growth kinetics (nucleation and evolution) of the electron-beam-evaporated Ag, leading to Ag films with smooth surface morphology and high electrical conductivity. The demonstrated Ag thin films are very promising for large-scale applications as molecular anchors, optical metamaterials, plasmonic devices, and several areas of nanophotonics.

Examining the anomalous electrical characteristics observed in InN nanowires.

Research interest in InN has intensified in recent years because of its unique material properties and promising applications in electronic and photonic devices. Measurements on InN nanowires presented by Chang et al., [J. Electron. Mater. 35, 738 (2006)] showed an anomalous resistance behavior in InN nanowires with diameters less than 90 nm. We examine possible theories presented in literature to explain this intriguing observation. We propose that the presence of a high density electron accumulation layer at the surface of thin InN nanowires is the most probable cause for the uncharacteristic relationship between the total measured resistance and the ratio of length-to-area. High density surface electron accumulation layer, characteristic of InN films and nanowire, promotes a surface conduction path distinct from the bulk conduction. For large diameter nanowires, bulk conduction is likely to be the dominant mechanism while surface conduction is proposed to play a major role for small diameter InN nanowires.

Metallic LiMo3Se3 nanowire film sensors for electrical detection of metal ions in water.

LiMo 3Se 3 nanowire film sensors were fabricated by drop-coating a 0.05% (mass) aqueous nanowire solution onto microfabricated indium tin oxide electrode pairs. According to scanning electron microscopy (SEM) and atomic force microscopy (AFM), the films are made of a dense network of 3-7 nm thick nanowire bundles. Immersion of the films in 1.0 M aqueous solutions of group 1 or 2 element halides or of Zn(II), Mn(II), Fe(II), or Co(II) chlorides results in an increase of the electrical resistance of the films. The resistance change is always positive and reaches up to 9% of the base resistance of the films. It occurs over the course of 30-240 s, and it is reversible for monovalent ions and partially reversible for divalent ions. The signal depends on the concentration of the electrolyte and on the size and charge of the metal cation. Anions do not play a significant role, presumably, because they are repelled by the negatively charged nanowire strands. The magnitude of the electrical response and its sign suggest that it is due to analyte-induced scattering of conduction electrons in the nanowires. An ion-induced field effect can be excluded based on gated conductance measurements of the nanowire films.

Ultra-low contact resistance of epitaxially interfaced bridged silicon nanowires.

Laterally oriented single-crystal silicon nanowires are epitaxially grown between highly doped vertically oriented silicon electrodes in the form of nanobridges. Resistance values extracted from the current-voltage measurements for a large number of nanobridges with varying lengths and diameters are used to propose a model which highlights the relative contribution of the contact resistance to the total resistance for nanowire-based devices. It is shown that the contact resistance depends on the effective conducting cross-section area and hence is influenced by the presence of a surface depletion layer. On the basis of our measured data and constructed model, we estimated the specific contact resistance to be in the range 3.74 x 10(-6) to 5.02 x 10(-6) Omega cm2 for our epitaxial interfacing method. This value is at least an order of magnitude lower than that of any known contact made to nanowires with an evaporated metal film, a common method for integrating semiconductor nanowires in devices and circuits.