Semiempirical Peak Fitting Guided by ab Initio Calculations of X-ray Photoelectron Spectroscopy Narrow Scans of Chemisorbed, Fluorinated Silanes.

Here, we address the issue of finding correct CF2/CF3 area ratios from X-ray photoelectron spectroscopy (XPS) C 1s narrow scans of materials containing -CH2CH2(CF2)nCF3 (n = 0, 1, 2, ...) moieties. For this work, we modified silicon wafers with four different fluorosilanes. The smallest had a trifluoropropyl (n = 0) moiety, followed by nonafluorohexyl (n = 3), tridecafluoro (n = 5), and finally, heptadecafluoro (n = 7) moieties. Monolayer deposition of the fluorosilanes was confirmed by spectroscopic ellipsometry, wetting, and XPS. Analysis of the trifluoropropyl (n = 0) surface and a sample of polytetrafluoroethylene provided pure-component XPS spectra for -CF3 and -(CF2)n- moieties, respectively. Initial XPS C 1s peak fitting, which follows the literature precedent, was not entirely adequate. To address this issue, six different fitting approaches with increasing complexity and/or input from the Hartree-Fock theory (HF) were considered. Ultimately, we show that by combining HF results with empirical analyses, we obtain more accurate CF2/CF3 area ratios while maintaining high-quality fits.

Superhydrophobic Surfaces with Very Low Hysteresis Prepared by Aggregation of Silica Nanoparticles During In Situ Urea-Formaldehyde Polymerization.

We present a new method for the preparation of superhydrophobic materials by in situ aggregation of silica nanoparticles on a surface during a urea-formaldehyde (UF) polymerization. This is a one-step process in which a two-tier topography is obtained. The polymerization is carried out for 30, 60, 120, 180, and 240 min on silicon shards. Silicon surfaces are sintered to remove the polymer. SEM and AFM show both an increase in the area covered by the nanoparticles and their aggregation with increasing polymerization time. Chemical vapor deposition of a fluorinated silane in the presence of a basic catalyst gives these surfaces hydrophobicity. Deposition of this low surface energy silane is confirmed by the F 1s signal in XPS. The surfaces show advancing water contact angles in excess of 160 degrees with very low hysteresis (< 7) after 120 min and 60 min polymerization times for 7 nm and 14 nm silica, respectively. Depositions are successfully demonstrated on glass substrates after they are primed with a UF polymer layer. Superhydrophobic surfaces can also be prepared on unsintered substrates.