RESUMO
Optical components manipulating both polarization and phase of wave fields find many applications in today's optical systems. With modern lithography methods it is possible to fabricate optical elements with nanostructured surfaces from different materials capable of generating spatially varying, locally linearly polarized-light distributions, tailored to the application in question. Since such elements in general also affect the phase of the light field, the characterization of the function of such elements consists in measuring the phase and the polarization of the generated light, preferably at the same time. Here, we will present first results of an interferometric approach for a simultaneous and spatially resolved measurement of both phase and polarization, as long as the local polarization at any point is linear (e.g., for radially or azimuthally polarized light).
