RESUMO
TiO2 thin films were deposited on quartz substrates by metal-organic chemical vapor deposition (MOCVD) at temperatures of 250, 350, and 450 °C. X-ray diffraction (XRD) data revealed the production of a pure anatase phase, a decrease in crystallite size, and a textural change as deposition temperature increased. Atomic force microscopy (AFM) was used to study the morphological properties and confirm XRD results. UV-Vis.-NIR spectroscopy was used to investigate the optical properties of the samples. The effect of deposition temperature on wettability was investigated using contact angle measurements. Sunlight photocatalytic properties increased with the increase in deposition temperature for methyl orange and methylene blue. Films were post-annealed at 500 °C for 2 h. The effect of annealing on all the above-mentioned properties was explored. The kinetic analysis demonstrated superb agreement with the kinetic pseudo-first-order model. The rate of photocatalytic degradation of MB was ~8, 13, and 12 times that of MO using 250, 350, and 450 °C deposited films, respectively. Photodegradation was found to depend on the specific surface area, type of pollutant, and annealing temperature.
