Gradation of proteins and cells attached to the surface of bio-inert zwitterionic polymer brush.

A self-assembled monolayer (SAM) of a 2-bromoisobutyryl end group-carrying initiator for atom transfer radical polymerization (ATRP) was constructed on the surface of silicon wafer or glass substrates via a silane-coupling reaction. When the initiator SAM was irradiated with UV light at 254nm, the surface density of bromine atoms was reduced by the scission of CBr bonds as observed by XPS. With the surface-initiated ATRP of the zwitterionic vinyl monomer, carboxymethyl betaine (CMB), the surface density of PCMB brushes could be easily varied by changing the irradiation period of UV light prior to the polymerization. Furthermore, by using a UV-cut shutter sliding above the initiator SAM-modified substrate at a constant speed, the degree of bromine atom removal could be linearly varied along the direction of movement of the shutter. Consequently, the amount of both proteins adsorbed and cells adhered to the PCMB brush-covered substrate could easily be controlled by the gradation of the surface density of PCMB brushes, which suppressed protein adsorption and cell adhesion. Such a technique is very simple and useful for the regulation of the surface density of adsorbed proteins and adhered cells on an originally bio-inert surface.

Patterning of photocleavable zwitterionic polymer brush fabricated on silicon wafer.

Brushes of a polymer, namely poly(carboxymethylbetaine) (PCMB), were fabricated on silicon wafers by reversible addition-fragmentation chain-transfer (RAFT) polymerization using a surface-confined RAFT agent having an aromatic group at its bottom. The polymer brush showed effective suppression of the non-specific adsorption of bovine serum albumin (BSA) and adhesion of fibroblasts (3T3 cells). In contrast, BSA and 3T3 cells significantly adsorbed on and adhered to positively or negatively charged polymer brushes fabricated by the same procedure. Upon UV irradiation at 193 nm, the thickness of the PCMB brush with an aromatic group at its bottom decreased significantly whereas PCMB prepared using a surface-confined RAFT agent without an aromatic group needed a much higher irradiation dose to afford a comparable decrease in thickness. These results indicate a preferential cleavage of the PCMB brush due to photodecomposition of the phenyl group at the bottom. BSA and 3T3 cells non-specifically adsorbed on and adhered to the UV irradiation-induced hollow spaces, respectively. Furthermore, a designed pattern with a resolution of 5 µm was successfully made on the PCMB brush above the silicon wafer by simple UV irradiation. These results suggest that the surface-confined aromatic RAFT agent will be quite useful for simple photolithography in biomedical fields.