Fast switching between the ground- and excited-state lasing in a quantum-dot microdisk triggered by sub-ps pulses.

A quantum-dot microdisk was optically pumped by continuous-wave excitation with a level sufficient for the ground-state lasing. The microdisk was additionally illuminated with sub-ps pulses of various powers. It was found that there is a critical level of pulse power that determines the subsequent transient process of the microlaser. Depending on the level of the pulsed excitation, the ground-state lasing intensity can be either enhanced (for weak pulses) or fully quenched (for strong pulses). In the latter case, the excited-state lasing is ignited for a short time. All dynamic phenomena occur on a time scale of the order of 100 ps, and the duration of the transient process as a whole (from the arrival of the excitation pulse to the restoration of steady-state intensities) lasts no more than 0.5 ns. Using this phenomenon, a microlaser can be rapidly switched between two states with the switching controlled by the level of the incoming optical pulse.

Two-state lasing in a quantum dot racetrack microlaser.

The peculiarities of two-state lasing in a racetrack microlaser with an InAs/GaAs quantum dot active region are investigated by measuring the electroluminescence spectra at various injection currents and temperatures. Unlike edge-emitting and microdisk lasers, where two-state lasing involves the ground and first excited-state optical transitions of quantum dots, in racetrack microlasers, we observe lasing through the ground and second excited states. As a result, the spectral separation between lasing bands is doubled to more than 150 nm. A temperature dependence of threshold currents for lasing via ground and second excited states of quantum dots was also obtained.

Photoluminescence Redistribution of InGaN Nanowires Induced by Plasmonic Silver Nanoparticles.

Hybrid nanostructures based on InGaN nanowires with decorated plasmonic silver nanoparticles are investigated in the present study. It is shown that plasmonic nanoparticles induce the redistribution of room temperature photoluminescence between short-wavelength and long-wavelength peaks of InGaN nanowires. It is defined that short-wavelength maxima decreased by 20%, whereas the long-wavelength maxima increased by 19%. We attribute this phenomenon to the energy transfer and enhancement between the coalesced part of the NWs with 10-13% In content and the tips above with an In content of about 20-23%. A proposed Fröhlich resonance model for silver NPs surrounded by a medium with refractive index of 2.45 and spread 0.1 explains the enhancement effect, whereas the decreasing of the short-wavelength peak is associated with the diffusion of charge carriers between the coalesced part of the NWs and the tips above.

Temperature Evolution of Two-State Lasing in Microdisk Lasers with InAs/InGaAs Quantum Dots.

One-state and two-state lasing is investigated experimentally and through numerical simulation as a function of temperature in microdisk lasers with Stranski-Krastanow InAs/InGaAs/GaAs quantum dots. Near room temperature, the temperature-induced increment of the ground-state threshold current density is relatively weak and can be described by a characteristic temperature of about 150 K. At elevated temperatures, a faster (super-exponential) increase in the threshold current density is observed. Meanwhile, the current density corresponding to the onset of two-state lasing was found to decrease with increasing temperature, so that the interval of current density of pure one-state lasing becomes narrower with the temperature increase. Above a certain critical temperature, ground-state lasing completely disappears. This critical temperature drops from 107 to 37 °C as the microdisk diameter decreases from 28 to 20 µm. In microdisks with a diameter of 9 µm, a temperature-induced jump in the lasing wavelength from the first excited-state to second excited-state optical transition is observed. A model describing the system of rate equations and free carrier absorption dependent on the reservoir population provides a satisfactory agreement with experimental results. The temperature and threshold current corresponding to the quenching of ground-state lasing can be well approximated by linear functions of saturated gain and output loss.

Submicron-Size Emitters of the 1.2-1.55 µm Spectral Range Based on InP/InAsP/InP Nanostructures Integrated into Si Substrate.

We study photoluminescence of InP/InAsP/InP nanostructures monolithically integrated to a Si(100) substrate. The InP/InAsP/InP nanostructures were grown in pre-formed pits in the silicon substrate using an original approach based on selective area growth and driven by a molten alloy in metal-organic vapor epitaxy method. This approach provides the selective-area synthesis of the ordered emitters arrays on Si substrates. The obtained InP/InAsP/InP nanostructures have a submicron size. The individual InP/InAsP/InP nanostructures were investigated by photoluminescence spectroscopy at room temperature. The tuning of the emission line in the spectral range from 1200 nm to 1550 nm was obtained depending on the growth parameters. These results provide a path for the growth on Si(100) substrate of position-controlled heterojunctions based on InAs1-xPx for nanoscale optical devices operating at the telecom band.

Selective Area Epitaxy of GaN Nanowires on Si Substrates Using Microsphere Lithography: Experiment and Theory.

GaN nanowires were grown using selective area plasma-assisted molecular beam epitaxy on SiOx/Si(111) substrates patterned with microsphere lithography. For the first time, the temperature-Ga/N2 flux ratio map was established for selective area epitaxy of GaN nanowires. It is shown that the growth selectivity for GaN nanowires without any parasitic growth on a silica mask can be obtained in a relatively narrow range of substrate temperatures and Ga/N2 flux ratios. A model was developed that explains the selective growth range, which appeared to be highly sensitive to the growth temperature and Ga flux, as well as to the radius and pitch of the patterned pinholes. High crystal quality in the GaN nanowires was confirmed through low-temperature photoluminescence measurements.

Improved performance of InGaAs/GaAs microdisk lasers epi-side down bonded onto a silicon board.

We study the impact of improved heat removal on the performance of InGaAs/GaAs microdisk lasers epi-side down bonded onto a silicon substrate. Unlike the initial characteristics of microlasers on a GaAs substrate, the former's bonding results in a decrease in thermal resistance by a factor of 2.3 (1.8) in microdisks with a diameter of 19 (31) µm, attributed to a thinner layered structure between the active region and the substrate and the better thermal conductivity of Si than GaAs. Bonded microdisk lasers show a 2.4-3.4-fold higher maximum output power, up to 21.7 mW, and an approximately 20% reduction in the threshold current. A record high 3 dB small-signal modulation bandwidth of 7.9 GHz for InGaAs/GaAs microdisk lasers is achieved.

Multi-colour light emission from InGaN nanowires monolithically grown on Si substrate by MBE.

InGaN nanostructures are among the most promising candidates for visible solid-state lighting and renewable energy sources. To date, there is still a lack of information about the influence of the growth conditions on the physical properties of these nanostructures. Here, we extend the study of InGaN nanowires growth directly on Si substrates by plasma-assisted molecular beam epitaxy. The results of the study showed that under appropriate growth conditions a change in the growth temperature of just 10 °C leads to a significant change in the structural and optical properties of the nanowires. InGaN nanowires with the areas containing 4%-10% of In with increasing tendency towards the top are formed at the growth temperature of 665 °C, while at the growth temperatures range of 655 °C-660 °C the spontaneously core-shell NWs are typically presented. In the latter case, the In contents in the core and the shell are about an order of magnitude different (e.g. 35% and 4% for 655 °C, respectively). The photoluminescence study of the NWs demonstrates a shift in the spectra from blue to orange in accordance with an increase of In content. Based on these results, a novel approach to the monolithic growth of InxGa1-xN NWs with multi-colour light emission on Si substrates by setting a temperature gradient over the substrate surface is proposed.

Monolithic integration of InP on Si by molten alloy driven selective area epitaxial growth.

We report a new approach for monolithic integration of III-V materials into silicon, based on selective area growth and driven by a molten alloy in metal-organic vapor epitaxy. Our method includes elements of both selective area and droplet-mediated growths and combines the advantages of the two techniques. Using this approach, we obtain organized arrays of high crystalline quality InP insertions into (100) oriented Si substrates. Our detailed structural, morphological and optical studies reveal the conditions leading to defect formation. These conditions are then eliminated to optimize the process for obtaining dislocation-free InP nanostructures grown directly on Si and buried below the top surface. The PL signal from these structures exhibits a narrow peak at the InP bandgap energy. The fundamental aspects of the growth are studied by modeling the InP nucleation process. The model is fitted by our X-ray diffraction measurements and correlates well with the results of our transmission electron microscopy and optical investigations. Our method constitutes a new approach for the monolithic integration of active III-V materials into Si platforms and opens up new opportunities in active Si photonics.

InAs/GaAs Quantum Dot Microlasers Formed on Silicon Using Monolithic and Hybrid Integration Methods.

An InAs/InGaAs quantum dot laser with a heterostructure epitaxially grown on a silicon substrate was used to fabricate injection microdisk lasers of different diameters (15-31 µm). A post-growth process includes photolithography and deep dry etching. No surface protection/passivation is applied. The microlasers are capable of operating heatsink-free in a continuous-wave regime at room and elevated temperatures. A record-low threshold current density of 0.36 kA/cm2 was achieved in 31 µm diameter microdisks operating uncooled. In microlasers with a diameter of 15 µm, the minimum threshold current density was found to be 0.68 kA/cm2. Thermal resistance of microdisk lasers monolithically grown on silicon agrees well with that of microdisks on GaAs substrates. The ageing test performed for microdisk lasers on silicon during 1000 h at a constant current revealed that the output power dropped by only ~9%. A preliminary estimate of the lifetime for quantum-dot (QD) microlasers on silicon (defined by a double drop of the power) is 83,000 h. Quantum dot microdisk lasers made of a heterostructure grown on GaAs were transferred onto a silicon wafer using indium bonding. Microlasers have a joint electrical contact over a residual n+ GaAs substrate, whereas their individual addressing is achieved by placing them down on a p-contact to separate contact pads. These microdisks hybridly integrated to silicon laser at room temperature in a continuous-wave mode. No effect of non-native substrate on device characteristics was found.

High speed data transmission using directly modulated microdisk lasers based on InGaAs/GaAs quantum well-dots.

We report on direct large signal modulation and the reliability studies of microdisk lasers based on InGaAs/GaAs quantum well-dots. A 23 µm in diameter microlaser exhibits an open eye diagram up to 12.5 Gbit/s and is capable of error-free 10 Gbit/s data transmission at 30°C without temperature stabilization. The ageing tests of a 31 µm in diameter microdisk laser were conducted at room and elevated temperatures during more than 1200 hr. The average rate of the output power degradation was about 25 and 29 nW/hr at 40°C and 60°C, respectively.

Dynamics of Broadband Lasing Cascade from a Single Dot-in-well InGaAs Microdisk.

The development of a fast semiconductor laser is required for the realization of next-generation telecommunication applications. Since lasers operating on quantum dot ground state transitions exhibit only limited gain due to the saturation effect, we investigate lasing from excited states and compare its corresponding static and dynamic behavior to the one from the ground state. InAs quantum dots (QDs) grown in dot-in-well (DWELL) structures allowed to obtain light emission from ground and three excited states in a spectral range of 1.0-1.3 µm. This emission was coupled to whispering gallery modes (WGMs) of a 6 µm microdisk resonator and studied at room temperature by steady-state and time-resolved micro-photoluminescence. We demonstrate a cascade development of lasing arising from the ladder of quantum dot states, and compare the lasing behavior of ground and excited state emission. While the lasing threshold is being increased from the ground state to the highest excited state, the dynamic behavior is improved: turn-on times and lifetimes of WGMs become shorter paving the way towards high frequency direct driven microlasers.

Highly efficient injection microdisk lasers based on quantum well-dots.

We study injection GaAs-based microdisk lasers capable of operating at room and elevated temperatures. A novel type of active region is used, namely InGaAs quantum well-dots representing a dense array of indium-rich islands formed inside an indium-depleted residual quantum well by metalorganic vapor phase epitaxy. We demonstrate a high output power of 18 mW, a differential efficiency of about 31%, and a peak electrical-to-optical power conversion efficiency of 15% in a 31 µm diameter microdisk laser. The continuous-wave lasing is observed up to 110°C.

Heat-sink free CW operation of injection microdisk lasers grown on Si substrate with emission wavelength beyond 1.3 µm.

High-performance injection microdisk (MD) lasers grown on Si substrate are demonstrated for the first time, to the best of our knowledge. Continuous-wave (CW) lasing in microlasers with diameters from 14 to 30 µm is achieved at room temperature. The minimal threshold current density of 600 A/cm2 (room temperature, CW regime, heatsink-free uncooled operation) is comparable to that of high-quality MD lasers on GaAs substrates. Microlasers on silicon emit in the wavelength range of 1320-1350 nm via the ground state transition of InAs/InGaAs/GaAs quantum dots. The high stability of the lasing wavelength (dλ/dI=0.1 nm/mA) and the low specific thermal resistance of 4×10-3°C×cm2/W are demonstrated.

Ultrasmall microdisk and microring lasers based on InAs/InGaAs/GaAs quantum dots.

Ultrasmall microring and microdisk lasers with an asymmetric air/GaAs/Al0.98Ga0.02As waveguide and an active region based on InAs/InGaAs/GaAs quantum dots emitting around 1.3 µm were fabricated and studied. The diameter D of the microrings and microdisks was either 2 or 1.5 µm, and the inner diameter d of the microrings varied from 20% to 70% of the outer diameter D. The microring with D = 2 µm and d = 0.8 µm demonstrated a threshold pump power as low as 1.8 µW at room temperature. Lasing was observed up to 100°C owing to the use of quantum dots providing high confinement energy both for electrons and holes. Tuning spectral positions of the whispering gallery modes via changing the inner diameters of the microrings was demonstrated. PACS: 78.67.Hc; 42.55.Sa; 42.50.Pq; 78.55.Cr.