Evaluation of preparation methods for suspended nano-objects on substrates for dimensional measurements by atomic force microscopy.

Dimensional measurements on nano-objects by atomic force microscopy (AFM) require samples of safely fixed and well individualized particles with a suitable surface-specific particle number on flat and clean substrates. Several known and proven particle preparation methods, i.e., membrane filtration, drying, rinsing, dip coating as well as electrostatic and thermal precipitation, were performed by means of scanning electron microscopy to examine their suitability for preparing samples for dimensional AFM measurements. Different suspensions of nano-objects (with varying material, size and shape) stabilized in aqueous solutions were prepared therefore on different flat substrates. The drop-drying method was found to be the most suitable one for the analysed suspensions, because it does not require expensive dedicated equipment and led to a uniform local distribution of individualized nano-objects. Traceable AFM measurements based on Si and SiO2 coated substrates confirmed the suitability of this technique.

Thermochemical nanopatterning of organic semiconductors.

Patterning of semiconducting polymers on surfaces is important for various applications in nanoelectronics and nanophotonics. However, many of the approaches to nanolithography that are used to pattern inorganic materials are too harsh for organic semiconductors, so research has focused on optical patterning and various soft lithographies. Surprisingly little attention has been paid to thermal, thermomechanical and thermochemical patterning. Here, we demonstrate thermochemical nanopatterning of poly(p-phenylene vinylene), a widely used electroluminescent polymer, by a scanning probe. We produce patterned structures with dimensions below 28 nm, although the tip of the probe has a diameter of 5 microm, and achieve write speeds of 100 microm s(-1). Experiments show that a resolution of 28 nm is possible when the tip-sample contact region has dimensions of approximately 100 nm and, on the basis of finite-element modelling, we predict that the resolution could be improved by using a thinner resist layer and an optimized probe. Thermochemical lithography offers a versatile, reliable and general nanopatterning technique because a large number of optical materials, including many commercial crosslinker additives and photoresists, rely on chemical mechanisms that can also be thermally activated.