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1.
Appl Opt ; 39(7): 1183-93, 2000 Mar 01.
Artigo em Inglês | MEDLINE | ID: mdl-18338002

RESUMO

Techniques for noninvasively measuring the oxygen saturation of blood in retinal arteries and veins are reported in the literature, but none have been sufficiently accurate and reliable for clinical use. Addressing the need for increased accuracy, we present a series of oximetric equations that explicitly consider the effects of backscattering by red blood cells and lateral diffusion of light in the ocular fundus. The equations are derived for the specific geometry of a scanning-beam retinal vessel oximeter; however, the results should also be applicable to photographic oximeters. We present in vitro and in vivo data that suggest the validity of these equations.

2.
Appl Opt ; 36(22): 5396-402, 1997 Aug 01.
Artigo em Inglês | MEDLINE | ID: mdl-18259360

RESUMO

The popular sheet polarizer, Polaroid HN22, has been measured to be a nearly half-wave retarder in the 3.6-5.4-microm spectral band with a transmittance of approximately 20%. Tuning of the retardance value between 60 degrees and 260 degrees has been demonstrated by tilting of the HN22 sheet with respect to the incident beam. The material's availability, relatively large aperture, large field of view, and low cost make it an excellent candidate for use as an infrared retarder for systems operating in this wave band. Thus HN22 may be employed as an inexpensive half-wave linear retarder and used for rotating the plane of polarization as well as for conversion between circular polarization states.

3.
Appl Opt ; 30(22): 3166-75, 1991 Aug 01.
Artigo em Inglês | MEDLINE | ID: mdl-20706370

RESUMO

Important data on chemical-vapor-deposited (CVD) SiC concerning the elastic modulus, polishability, scattering measurement, thermal and cryogenic stability, and degradation owing to the effects of atomic oxygen and electron beams have been obtained with the aim of assessing the suitability of SiC as an optical substrate for severe environments. These measurements show that CVD SiC substrates exhibit excellent polishability (<0.1 nm rms) with low scatter, good retention of mechanical properties up to 1500 degrees C, superior thermal and cryogenic stability (-190 degrees to 1350 degrees C) and high resistance to atomic-oxygen and electron-beam degradation. These results suggest that CVD SiC optical substrates will perform extremely well in severe environments such as outer space, and when used in lasers, combustion, and synchrotron x rays.

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