1.
Nanomaterials (Basel)
; 12(19)2022 Oct 05.
Artigo
em Inglês
| MEDLINE
| ID: mdl-36234616
RESUMO
Atomic layer deposition (ALD) is a vapor-phase technique that consists of the alternation of separated self-limiting surface reactions, which enable film thickness to be accurately controlled at the angstrom level, based on the former atomic layer epitaxy method [...].