Si/Organic Integrated Narrowband Near-Infrared Photodetector.

Spectrally selective narrowband photodetection is critical for near-infrared (NIR) imaging applications, such as for communicationand night-vision utilities. It is a long-standing challenge for detectors based on silicon, to achieve narrowband photodetection without integrating any optical filters. Here, this work demonstrates a NIR nanograting Si/organic (PBDBT-DTBT:BTP-4F) heterojunction photodetector (PD), which for the first time obtains the full-width-at-half-maximum (FWHM) of only 26 nm and fast response of 74 µs at 895 nm. The response peak can be successfully tailored from 895 to 977 nm. The sharp and narrow response NIR peak is inherently attributed to the coherent overlapping between the NIR transmission spectrum of organic layer and diffraction enhanced absorption peak of patterned nanograting Si substrates. The finite difference time domain (FDTD) physics calculation confirms the resonant enhancement peaks, which is well consistent with the experiment results. Meanwhile, the relative characterization indicates that the introduction of the organic film can promote carrier transfer and charge collection, facilitating efficient photocurrent generation. This new device design strategy opens up a new window in developing low-cost sensitive NIR narrowband detection.

High-fidelity and clean nanotransfer lithography using structure-embedded and electrostatic-adhesive carriers.

Metallic nanostructures are becoming increasingly important for both fundamental research and practical devices. Many emerging applications employing metallic nanostructures often involve unconventional substrates that are flexible or nonplanar, making direct lithographic fabrication very difficult. An alternative approach is to transfer prefabricated structures from a conventional substrate; however, it is still challenging to maintain high fidelity and a high yield in the transfer process. In this paper, we propose a high-fidelity, clean nanotransfer lithography method that addresses the above challenges by employing a polyvinyl acetate (PVA) film as the transferring carrier and promoting electrostatic adhesion through triboelectric charging. The PVA film embeds the transferred metallic nanostructures and maintains their spacing with a remarkably low variation of <1%. When separating the PVA film from the donor substrate, electrostatic charges are generated due to triboelectric charging and facilitate adhesion to the receiver substrate, resulting in a high large-area transfer yield of up to 99.93%. We successfully transferred the metallic structures of a variety of materials (Au, Cu, Pd, etc.) with different geometries with a <50-nm spacing, high aspect ratio (>2), and complex 3D structures. Moreover, the thin and flexible carrier film enables transfer on highly curved surfaces, such as a single-mode optical fiber with a curvature radius of 62.5 µm. With this strategy, we demonstrate the transfer of metallic nanostructures for a compact spectrometer with Cu nanogratings transferred on a convex lens and for surface-enhanced Raman spectroscopy (SERS) characterization on graphene with reliable responsiveness.

Spatial modulation of nanopattern dimensions by combining interference lithography and grayscale-patterned secondary exposure.

Functional nanostructures are exploited for a variety of cutting-edge fields including plasmonics, metasurfaces, and biosensors, just to name a few. Some applications require nanostructures with uniform feature sizes while others rely on spatially varying morphologies. However, fine manipulation of the feature size over a large area remains a substantial challenge because mainstream approaches to precise nanopatterning are based on low-throughput pixel-by-pixel processing, such as those utilizing focused beams of photons, electrons, or ions. In this work, we provide a solution toward wafer-scale, arbitrary modulation of feature size distribution by introducing a lithographic portfolio combining interference lithography (IL) and grayscale-patterned secondary exposure (SE). Employed after the high-throughput IL, a SE with patterned intensity distribution spatially modulates the dimensions of photoresist nanostructures. Based on this approach, we successfully fabricated 4-inch wafer-scale nanogratings with uniform linewidths of <5% variation, using grayscale-patterned SE to compensate for the linewidth difference caused by the Gaussian distribution of the laser beams in the IL. Besides, we also demonstrated a wafer-scale structural color painting by spatially modulating the filling ratio to achieve gradient grayscale color using SE.

Ultrasensitive Molecular Detection by Imaging of Centimeter-Scale Metasurfaces with a Deterministic Gradient Geometry.

Highly sensitive detection of trace amounts of substances is crucial for broad applications in healthcare, environmental monitoring, antiterrorism, etc., where cost effectiveness and portability are often demanded. Here, an ultrasensitive sensor is reported that can detect an angstrom-thick layer of adsorbed molecules through image acquisition and processing. The sensor features a centimeter-scale plasmonic metasurface with spatially varying geometry, where the light scattering is dependent on both the adsorbed substances and spatial locations. When illuminated with narrowband light (such as from a light emitting diode), the intensity pattern recorded on the metasurface changes with the surface-adsorbed molecules, enabling label-free, sensitive, and spectrometer-free molecular detection. The centimeter-scale size of the sensing area interfaces well with consumer-level imaging sensors on mobile devices without the need for microscopic optics and offers a high signal-to-noise ratio by leveraging the multimillion pixels for noise reduction. It is experimentally demonstrated that a single layer of Al2 O3 molecules deposited on the sensor, with a thickness of approximately one angstrom, can be detected by analyzing the images taken of the sensing chip. Furthermore, by integrating the sensor into a microfluidic setup, quantitative detection of BSA/anti-BSA immune complex formation events is demonstrated, which agrees well with the Langmuir isotherm model.

On-Demand 3D Printing of Nanowire Probes for High-Aspect-Ratio Atomic Force Microscopy Imaging.

With the growing importance of three-dimensional (3D) nanomaterials and devices, there has been a great demand for high-fidelity, full profile topographic characterizations in a nondestructive manner. A promising route is to employ a high-aspect-ratio (HAR) probe in atomic force microscopy (AFM) imaging. However, the fabrication of HAR-AFM probes continues to suffer from extravagant cost, limited material choice, and complicated manufacturing steps. Here, we report one-step, on-demand electrohydrodynamic 3D printing of metallic HAR-AFM probes with tailored dimensions. Our additive fabrication approach yields a freestanding metallic nanowire with an aspect ratio over 30 directly on a cantilever within tens of seconds, producing a HAR-AFM probe. Furthermore, the benefits associated with unprecedented simplicity in the probe's dimension control, material selection, and regeneration are provided. The 3D-printed HAR-AFM probe exhibits a better fidelity in deep trench AFM imaging than a standard pyramidal probe. We expect this approach to find facile, material-saving manufacturing routes in particular for customizing functional nanoprobes.

Gradient wettability induced by deterministically patterned nanostructures.

We report a large-scale surface with continuously varying wettability induced by ordered gradient nanostructures. The gradient pattern is generated from nonuniform interference lithography by utilizing the Gaussian-shaped intensity distribution of two coherent laser beams. We also develop a facile fabrication method to directly transfer a photoresist pattern into an ultraviolet (UV)-cured high-strength replication molding material, which eliminates the need for high-cost reactive ion etching and e-beam evaporation during the mold fabrication process. This facile mold is then used for the reproducible production of surfaces with gradient wettability using thermal-nanoimprint lithography (NIL). In addition, the wetting behavior of water droplets on the surface with the gradient nanostructures and therefore gradient wettability is investigated. A hybrid wetting model is proposed and theoretically captures the contact angle measurement results, shedding light on the wetting behavior of a liquid on structures patterned at the nanoscale.