RESUMO
We report on the development of a digital-micromirror-device (DMD)-based multishot snapshot spectral imaging (DMD-SSI) system as an alternative to current piezostage-based multishot coded aperture snapshot spectral imager (CASSI) systems. In this system, a DMD is used to implement compressive sensing (CS) measurement patterns for reconstructing the spatial/spectral information of an imaging scene. Based on the CS measurement results, we demonstrated the concurrent reconstruction of 24 spectral images. The DMD-SSI system is versatile in nature as it can be used to implement independent CS measurement patterns in addition to spatially shifted patterns that piezostage-based systems can offer.
RESUMO
In this paper we present the design and implementation of a Compressive Sensing Microscopy (CSM) imaging system, which uses the Compressive Sensing (CS) method to realize optical-sectioning imaging. The theoretical aspect of the proposed system is investigated using the mathematical model of the CS method and an experimental prototype is constructed to verify the CSM design. Compared to conventional optical-sectioning microscopes (such as Laser Scanning Confocal Microscopes (LSCMs) or Programmable Array Microscopes (PAMs)), the CSM system realizes optical-sectioning imaging using a single-pixel photo detector and without any mechanical scanning process. The complete information of the imaging scene is reconstructed from the CS measurements numerically.
RESUMO
In this paper, we demonstrate a fabrication process for large area (2 mm × 2 mm) fishnet metamaterial structures for near IR wavelengths. This process involves: (a) defining a sacrificial Si template structure onto a quartz wafer using deep-UV lithography and a dry etching process (b) deposition of a stack of Au-SiO2-Au layers and (c) a 'lift-off' process which removes the sacrificial template structure to yield the fishnet structure. The fabrication steps in this process are compatible with today's CMOS technology making it eminently well suited for batch fabrication. Also, depending on area of the exposure mask available for patterning the template structure, this fabrication process can potentially lead to optical metamaterials spanning across wafer-size areas.