Plasma-assisted catalytic formation of ammonia in N2-H2 plasma on a tungsten surface.

Plasma catalysis has drawn attention in the past few decades as a possible alternative to the Haber-Bosch process for ammonia production. In particular, radio frequency plasma assisted catalysis has the advantage of its adaptability to the industrial scale. However, in the past years, very few experimental studies have focused on the synthesis of ammonia from nitrogen/hydrogen radio frequency plasma. As a consequence, to date, there has been little agreement about the complex mechanisms underlying the radio frequency plasma-catalyst interactions. Gaining such an understanding is therefore essential for exploiting the potential of radio frequency plasma catalysis for ammonia production. In this study, we present results of ammonia formation from a nitrogen/hydrogen radio frequency plasma both without and with a tungsten catalyst for different initial nitrogen ratios. High yields of ammonia up to 32% at 25/75% of nitrogen/hydrogen were obtained using a combination of radio frequency low pressure plasma and a W surface as a catalyst. Furthermore, based on chemical analysis of the catalytic surface composition, a formation pathway of ammonia via the Eley-Rideal mechanism between adsorbed nitrogen and hydrogen from the gas phase is presented.

Valence band behaviour of zirconium oxide, Photoelectron and Auger spectroscopy study.

In this study X-ray Photoelectron Spectroscopy and Ultraviolet Photoelectron Spectroscopy were combined to investigate the effect of oxygen incorporation on the valence band behaviour of ZrOx. The Auger transitions involving valence bands are found to mimic the self-folded density of state measured using Ultraviolet Photoelectron Spectroscopy. The valence band once constructed in a sub-oxide form, stays at a fixed energy position despite the change in the stoichiometry. This behaviour is found to be useful in setting a reference for X-ray Photoelectron Spectroscopy charge correction. The results of the charged corrected spectra were compared to other methods and found to be in great agreement. Finally, a correlation between the core-level binding energy and the structural property of ZrOx is given.

Transoid-to-Cisoid Conformation Changes of Single Molecules on Surfaces Triggered by Metal Coordination.

Conformational isomers are stereoisomers that can interconvert over low potential barriers by rotation around a single bond. However, such bond rotation is hampered by geometrical constraints when molecules are adsorbed on surfaces. Here, we show that the adsorption of 4,4'-bis(4-carboxyphenyl)-6,6'-dimethyl-2,2'-bipyridine molecules on surfaces leads to the appearance of prochiral single molecules on NiO(001) and to enantiopure supramolecular domains on Au(111) surfaces containing the transoid-molecule conformation. Upon additional Fe adatom deposition, molecules undergo a controlled interconversion from a transoid-to-cisoid conformation as a result of coordination of the Fe atoms to the 2,2'-bipyridine moieties. As confirmed by atomic force microscopy images and X-ray photoelectron spectroscopy measurements, the resulting molecular structures become irreversibly achiral.

Restoring the Electrical Properties of CVD Graphene via Physisorption of Molecular Adsorbates.

Chemical vapor deposition (CVD) is a powerful technique to produce graphene for large-scale applications. Polymer-assisted wet transfer is commonly used to move the graphene onto silicon substrates, but the resulting devices tend to exhibit p-doping, which decreases the device quality and reproducibility. In an effort to better understand the origin of this effect, we coated graphene with n-methyl-2-pyrrolidone (NMP) and hexamethyldisilazane (HMDS) molecules that exhibit negligible charge transfer to graphene but bind more strongly to graphene than ambient adsorbents. Using Raman spectroscopy, X-ray photoelectron spectroscopy (XPS), electrical transport measurements, and quantum mechanical computer simulations, we show that the molecules help in the removal of p-doping, and our data indicate that the molecules do this by replacing ambient adsorbents (typically O2 and water) on the graphene surface. This very simple method of improving the electronic properties of CVD graphene by passivating its surface with common solvent molecules will accelerate the development of CVD graphene-based devices.

Morphological changes of tungsten surfaces by low-flux helium plasma treatment and helium incorporation via magnetron sputtering.

The effect of helium on the tungsten microstructure was investigated first by exposure to a radio frequency driven helium plasma with fluxes of the order of 1 × 10(19) m(-2) s(-1) and second by helium incorporation via magnetron sputtering. Roughening of the surface and the creation of pinholes were observed when exposing poly- and nanocrystalline tungsten samples to low-flux plasma. A coating process using an excess of helium besides argon in the process gas mixture leads to a porous thin film and a granular surface structure whereas gas mixture ratios of up to 50% He/Ar (in terms of their partial pressures) lead to a dense structure. The presence of helium in the deposited film was confirmed with glow-discharge optical emission spectroscopy and thermal desorption measurements. Latter revealed that the highest fraction of the embedded helium atoms desorb at approximately 1500 K. Identical plasma treatments at various temperatures showed strongest modifications of the surface at 1500 K, which is attributed to the massive activation of helium singly bond to a single vacancy inside the film. Thus, an efficient way of preparing nanostructured tungsten surfaces and porous tungsten films at low fluxes was found.