Enhanced Radiosensitization of Gold Nanospikes via Hyperthermia in Combined Cancer Radiation and Photothermal Therapy.

Metallic nanostructures as excellent candidates for nanosensitizers have shown enormous potentials in cancer radiotherapy and photothermal therapy. Clinically, a relatively low and safe radiation dose is highly desired to avoid damage to normal tissues. Therefore, the synergistic effect of the low-dosed X-ray radiation and other therapeutic approaches (or so-called "combined therapeutic strategy") is needed. Herein, we have synthesized hollow and spike-like gold nanostructures by a facile galvanic replacement reaction. Such gold nanospikes (GNSs) with low cytotoxicity exhibited high photothermal conversion efficiency (η = 50.3%) and had excellent photostability under cyclic near-infrared (NIR) laser irradiations. We have demonstrated that these GNSs can be successfully used for in vitro and in vivo X-ray radiation therapy and NIR photothermal therapy. For the in vitro study, colony formation assay clearly demonstrated that GNS-mediated photothermal therapy and X-ray radiotherapy reduced the cell survival fraction to 89% and 51%, respectively. In contrast, the cell survival fraction of the combined radio- and photothermal treatment decreased to 33%. The synergistic cancer treatment performance was attributable to the effect of hyperthermia, which efficiently enhanced the radiosensitizing effect of hypoxic cancer cells that were resistant to ionizing radiation. The sensitization enhancement ratio (SER) of GNSs alone was calculated to be about 1.38, which increased to 1.63 when the GNS treatment was combined with the NIR irradiation, confirming that GNSs are effective radiation sensitizers to enhance X-ray radiation effect through hyperpyrexia. In vivo tumor growth study indicated that the tumor growth inhibition (TGI) in the synergistically treated group reached 92.2%, which was much higher than that of the group treated with the GNS-enhanced X-ray radiation (TGI = 29.8%) or the group treated with the GNS-mediated photothermal therapy (TGI = 70.5%). This research provides a new method to employ GNSs as multifunctional nanosensitizers for synergistic NIR photothermal and X-ray radiation therapy in vitro and in vivo.

Probing the molecular structures of plasma-damaged and surface-repaired low-k dielectrics.

Fully understanding the effect and the molecular mechanisms of plasma damage and silylation repair on low dielectric constant (low-k) materials is essential to the design of low-k dielectrics with defined properties and the integration of low-k dielectrics into advanced interconnects of modern electronics. Here, analytical techniques including sum frequency generation vibrational spectroscopy (SFG), Fourier transform infrared spectroscopy (FTIR), contact angle goniometry (CA) and X-ray photoelectron spectroscopy (XPS) have been employed to provide a comprehensive characterization of the surface and bulk structure changes of poly(methyl)silsesquioxane (PMSQ) low-k thin films before and after O2 plasma treatment and silylation repair. O2 plasma treatment altered drastically both the molecular structures and water structures at the surfaces of the PMSQ film while no bulk structural change was detected. For example, ∼34% Si-CH3 groups were removed from the PMSQ surface, and the Si-CH3 groups at the film surface tilted toward the surface after the O2 plasma treatment. The oxidation by the O2 plasma made the PMSQ film surface more hydrophilic and thus enhanced the water adsorption at the film surface. Both strongly and weakly hydrogen bonded water were detected at the plasma-damaged film surface during exposure to water with the former being the dominate component. It is postulated that this enhancement of both chemisorbed and physisorbed water after the O2 plasma treatment leads to the degradation of low-k properties and reliability. The degradation of the PMSQ low-k film can be recovered by repairing the plasma-damaged surface using a silylation reaction. The silylation method, however, cannot fully recover the plasma induced damage at the PMSQ film surface as evidenced by the existence of hydrophilic groups, including C-O/C[double bond, length as m-dash]O and residual Si-OH groups. This work provides a molecular level picture on the surface structural changes of low-k materials after plasma treatment and the subsequent silylation repair.

Controlled drug release and hydrolysis mechanism of polymer-magnetic nanoparticle composite.

Uniform and multifunctional poly(lactic acid) (PLA)-nanoparticle composite has enormous potential for applications in biomedical and materials science. A detailed understanding of the surface and interface chemistry of these composites is essential to design such materials with optimized function. Herein, we designed and investigated a simple PLA-magnetic nanoparticle composite system to elucidate the impact of nanoparticles on the degradation of polymer-nanoparticle composites. In order to have an in-depth understanding of the mechanisms of hydrolysis in PLA-nanoparticle composites, degradation processes were monitored by several surface sensitive techniques, including scanning electron microscopy, contact angle goniometry, atomic force microscopy, and sum frequency generation spectroscopy. As a second-order nonlinear optical technique, SFG spectroscopy was introduced to directly probe in situ chemical nature at the PLA-magnetic nanoparticle composite/aqueous interface, which allowed for the delineation of molecular mechanisms of various hydrolysis processes for degradation at the molecular level. The best PLA-NP material, with a concentration of 20% MNP in the composite, was found to enhance the drug release rate greater than 200 times while maintaining excellent controlled drug release characteristics. It was also found that during hydrolysis, various crystalline-like PLA domains on the surfaces of PLA-nanoparticle composites influenced various hydrolysis behaviors of PLA. Results from this study provide new insight into the design of nanomaterials with controlled degradation and drug release properties, and the underlined molecular mechanisms. The methodology developed in this study to characterize the polymer-nanoparticle composites is general and widely applicable.

Nondestructive in situ characterization of molecular structures at the surface and buried interface of silicon-supported low-k dielectric films.

As low-k dielectric/copper interconnects continue to scale down in size, the interfaces of low-k dielectric materials will increasingly determine the structure and properties of the materials. We report an in situ nondestructive characterization method to characterize the molecular structure at the surface and buried interface of silicon-supported low-k dielectric thin films using interface sensitive infrared-visible sum frequency generation vibrational spectroscopy (SFG). Film thickness-dependent reflected SFG signals were observed, which were explained by multiple reflections of the input and SFG beams within the low-k film. The effect of multiple reflections on the SFG signal was determined by incorporating thin-film interference into the local field factors at the low-k/air and Si/low-k interfaces. Simulated thickness-dependent SFG spectra were then used to deduce the relative contributions of the low-k/air and low-k/Si interfaces to the detected SFG signal. The nonlinear susceptibilities at each interface, which are directly related to the interfacial molecular structure, were then deduced from the isolated interfacial contributions to the detected SFG signal. The method developed here is general and demonstrates that SFG measurements can be integrated into other modern analytical and microfabrication methods that utilize silicon-based substrates. Therefore, the molecular structure at the surface and buried interface of thin polymer or organic films deposited on silicon substrates can be measured in the same experimental geometry used to measure many optical, electrical, and mechanical properties.

In situ observation of water behavior at the surface and buried interface of a low-k dielectric film.

Water adsorption in porous low-k dielectrics has become a significant challenge for both back-end-of-line integration and reliability. A simple method is proposed here to achieve in situ observation of water structure and water-induced structure changes at the poly(methyl silsesquioxane) (PMSQ) surface and the PMSQ/solid buried interface at the molecular level by combining sum frequency generation (SFG) vibrational spectroscopic and Fourier transform infrared (FTIR) spectroscopic studies. First, in situ SFG investigations of water uptake were performed to provide direct evidence that water diffuses predominantly along the PMSQ/solid interface rather than through the bulk. Furthermore, SFG experiments were conducted at the PMSQ/water interface to simulate water behavior at the pore inner surfaces for porous low-k materials. Water molecules were found to form strong hydrogen bonds at the PMSQ surface, while weak hydrogen bonding was observed in the bulk. However, both strongly and weakly hydrogen bonded water components were detected at the PMSQ/SiO2 buried interface. This suggests that the water structures at PMSQ/solid buried interfaces are also affected by the nature of solid substrate. Moreover, the orientation of the Si-CH3 groups at the buried interface was permanently changed by water adsorption, which might due to low flexibility of Si-CH3 groups at the buried interface. In brief, this study provides direct evidence that water molecules tend to strongly bond (chemisorbed) with low-k dielectric at pore inner surfaces and at the low-k/solid interface of porous low-k dielectrics. Therefore, water components at the surfaces, rather than the bulk, are likely more responsible for chemisorbed water related degradation of the interconnection layer. Although the method developed here was based on a model system study, we believe it should be applicable to a wide variety of low-k materials.

Molecular behavior at buried epoxy/poly(ethylene terephthalate) interface.

Epoxies are widely used as main components in packaging underfills for microelectronics. Their strong adhesion to different substrate materials is an important factor for the functioning of electronic devices. Amines are commonly used cross-linking agents for epoxides. However, the molecular mechanisms of epoxide-amine mixture adhesion to substrate materials remain unclear. In this research we investigated the adhesion mechanism of epoxide-amine mixtures at poly(ethylene terephthalate) (PET) interfaces using attenuated total-internal reflection Fourier transform infrared (ATR-FTIR) spectroscopy and sum frequency generation (SFG) vibrational spectroscopy. Results show that both epoxide and amine could diffuse into the PET film. They could also dissolve or modify the PET film at the interphase region. In the process of epoxy curing on PET, epoxide molecules could cross-link with the modified PET film, providing strong adhesion. This hypothesis was further confirmed by adding reactive and nonreactive silanes to the epoxies and measuring the adhesion strengths of such mixtures to PET. The reactive silanes could cross-link with the system, showing good adhesion, while the nonreactive silane prevented sufficient cross-linking, showing poor adhesion. This research developed an in-depth insight for molecular behaviors at the epoxy/PET interface which helped clarify the related adhesion mechanism.

Molecular ordering of phenyl groups at the buried polystyrene/metal interface.

Understanding molecular structures of buried polymer/metal interfaces is important for the design and development of polymer adhesives used in advanced microelectronic devices and polymer anticorrosion coatings for metals. The buried interfacial molecular structure between polystyrene (PS) and silver (Ag) was investigated using infrared-visible sum frequency generation (SFG) vibrational spectroscopy via a "sandwiched" sample geometry. SFG resonant signals from the phenyl C-H stretching vibrational modes were detected from the PS/Ag interface, suggesting that the PS phenyl groups at this buried polymer/metal interface are ordered. Spectral analysis indicated that the phenyl groups at the buried PS/Ag interface tilt toward the interface, pointing away from the Ag side.

Influence of casting solvent on phenyl ordering at the surface of spin cast polymer thin films.

Controlling the surface molecular structure of spin cast polymer films is important for the rational design of surface properties. However, the relationship between spin casting parameters and film surface molecular structure is poorly understood. We report that the surface molecular structure of spin cast homopolymers which contain phenyl groups is influenced by the solvent aromaticity, investigated by a nonlinear optical spectroscopy, sum frequency generation (SFG) vibrational spectroscopy. When phenyl groups were located in a linear polymer backbone, spin casting with aromatic solvents enhanced the phenyl SFG signal relative to when a non-aromatic solvent was used which suggests that the aromatic solvent induced the surface phenyl groups to be more ordered and/or to lie more perpendicular to the film surface. In addition, when alkyl structures were believed to be present at the solvent/air interface, alkyl structures were observed at the film/air interface which suggests that molecular structure at the solvent/air interface was carried to the film surface. The effects of solvent aromaticity on phenyl ordering at spin cast film surfaces can be explained by different molecular structures of polymer chains at solvent/air interfaces, preferential solvation of functional groups during evaporation, and re-orientation of bulky side groups at the polymer film/air interface.

Hygrothermal aging effects on buried molecular structures at epoxy interfaces.

Interfacial properties such as adhesion are determined by interfacial molecular structures. Adhesive interfaces in microelectronic packages that include organic polymers such as epoxy are susceptible to delamination during accelerated stress testing. Infrared-visible sum frequency generation vibrational spectroscopy (SFG) and attenuated total reflectance Fourier transform infrared spectroscopy (ATR-FTIR) were used to study molecular structures at buried epoxy interfaces during hygrothermal aging to relate molecular structural changes at buried interfaces to decreases in macroscopic adhesion strength. SFG peaks associated with strongly hydrogen bonded water were detected at hydrophilic epoxy interfaces. Ordered interfacial water was also correlated to large decreases in interfacial adhesion strength that occurred as a result of hygrothermal aging, which suggests that water diffused to the interface and replaced original hydrogen bond networks. No water peaks were observed at hydrophobic epoxy interfaces, which was correlated with a much smaller decrease in adhesion strength from the same aging process. ATR-FTIR water signals observed in the epoxy bulk were mainly contributed by relatively weakly hydrogen bonded water molecules, which suggests that the bulk and interfacial water structure was different. Changes in interfacial methyl structures were observed regardless of the interfacial hydrophobicity which could be due to water acting as a plasticizer that restructured both the bulk and interfacial molecular structure. This research demonstrates that SFG studies of molecular structural changes at buried epoxy interfaces during hygrothermal aging can contribute to the understanding of moisture-induced failure mechanisms in electronic packages that contain organic adhesives.

Development of an automated on-line electrochemical chlorite ion sensor.

A sensor system for the automatic, in-line, determination of chlorite ion is reported. Electroanalytical measurements were performed in electrolyte-free liquids by using an electrochemical probe (EC), which enables in-line detection in high-resistance media such as disinfected water. Cyclic voltammetry scan rate studies suggest that the current arising from the oxidation of chlorite ion at an EC probe is mass-transfer limited. By coupling FIA with an EC probe amperometric cell, automated analysis was achieved. This sensor is intended to fulfill the daily monitoring requirements of the EPA DBP regulations for chlorite ion. Detection limits of 0.02-0.13 mg/L were attained, which is about one order of magnitude below the MRDL. The sensor showed no faradaic signal for perchlorate, chlorate, or nitrate. The lifetime and stability of the sensor were investigated by measuring calibration curves over time under constant-flow conditions. Detection limits of <0.1 mg/L were repeatedly achieved over a period of three weeks.