Dataset for residual stress measurements via neutron diffraction of thermally sprayed Inconel 625 coating on 304 stainless steel.

Fundamental understanding of factors and mechanisms controlling the residual stress formation in material coatings is critical for selection of optimum synthesis and deposition parameters. This article contains data from the investigation of the residual stress properties of Inconel 625 coating measured at different coating thicknesses, 250 µm,300 µm, 350 µm and 400 µm, deposited on 304 stainless steel (SS) substrate using high-velocity oxy-fuel (HVOF) spraying technique. The neutron diffraction technique was employed to measure the residual stresses of the coated specimen. Data provided provides insights into the influence of coating thickness on the residual stress of the material and therefore on the overall mechanical performance and applicability of the component.

Effect of Microstructural and Tribological Behaviors of Sputtered Titanium Carbide Thin Film on Copper Substrate.

Titanium carbide (TiC) thin films were deposited by radio frequency magnetron sputtering (RFMS) onto a copper substrate by using Argon (Ar) gas plasma at a gas flow rate of 10.0 sccm. The effect of time and temperature at a constant RF power on the structural and tribological properties were respectively investigated by atomic force spectroscopy (AFM), X-ray Diffraction (XRD), Fourier transform infrared (FTIR) spectroscopy, optical microscopy (OM), scanning electron microscopy (SEM) and tribological measurements. All films were tested to have crystal structures with the preferential plane (111) and dominant plane (200) grain orientations. Thus, plane (111) has phase identification of Cu(Cu16Ti)0.23 for some samples, whereas plane (200) has a phase identification of Cu(Cu0.997Ti0.003) and Cu(Cu0.923Ti0.077) for other samples. The lowest thin film roughness of 19.797 nm was observed in the sample, with RF power, sputtering time, and a temperature of 200 W, for two hours and 80 °C, respectively. The FTIR spectra of TiC films formed under different sputtering times (2-3 h) and temperatures (80 °C-100 °C) on Cu substrates at a constant sputtering power of 200 W in the range of 5000-500 cm-1. The peaks at 540 cm-1, 780 cm-1, and 1250 cm-1 are presented in the FTIR spectra and the formation of a Ti-C bond was observed. On the other hand, a sample was revealed to have the lowest wear volume of 5.1 × 10-3 mm3 while another sample was obtained with the highest wear volume of 9.3 × 10-3 mm3.