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1.
Nat Mater ; 11(2): 148-54, 2011 Dec 04.
Artigo em Inglês | MEDLINE | ID: mdl-22138793

RESUMO

Silicon photonics meets the electronics requirement of increased speed and bandwidth with on-chip optical networks. All-optical data management requires nonlinear silicon photonics. In silicon only third-order optical nonlinearities are present owing to its crystalline inversion symmetry. Introducing a second-order nonlinearity into silicon photonics by proper material engineering would be highly desirable. It would enable devices for wideband wavelength conversion operating at relatively low optical powers. Here we show that a sizeable second-order nonlinearity at optical wavelengths is induced in a silicon waveguide by using a stressing silicon nitride overlayer. We carried out second-harmonic-generation experiments and first-principle calculations, which both yield large values of strain-induced bulk second-order nonlinear susceptibility, up to 40 pm V(-1) at 2,300 nm. We envisage that nonlinear strained silicon could provide a competing platform for a new class of integrated light sources spanning the near- to mid-infrared spectrum from 1.2 to 10 µm.

2.
J Nanosci Nanotechnol ; 1(2): 159-68, 2001 Jun.
Artigo em Inglês | MEDLINE | ID: mdl-12914047

RESUMO

Silicon nanocrystals (Si-nc) embedded in SiO2 matrix have been prepared by high temperature thermal annealing (1000-1250 degrees C) of substoichiometric SiOx films deposited by plasma-enhanced chemical vapor deposition (PECVD). Different techniques have been used to examine the optical and structural properties of Si-nc. Transmission electron microscopy analysis shows the formation of nanocrystals whose sizes are dependent on annealing conditions and deposition parameters. The spectral positions of room temperature photoluminescence are systematically blue shifted with reduction in the size of Si-nc obtained by decreasing the annealing temperature or the Si content during the PECVD deposition. A similar trend has been found in optical absorption measurements. X-ray absorption fine structure measurements indicate the presence of an intermediate region between the Si-nc and the SiO2 matrix that participates in the light emission process. Theoretical observations reported here support these findings. All these efforts allow us to study the link between dimensionality, optical properties, and the local environment of Si-nc and the surrounding SiO2 matrix.


Assuntos
Cristalização/métodos , Modelos Moleculares , Nanotecnologia/métodos , Dióxido de Silício/química , Silício/química , Simulação por Computador , Gases/química , Temperatura Alta , Luminescência , Conformação Molecular , Oxigênio/química , Silício/isolamento & purificação , Silício/efeitos da radiação , Dióxido de Silício/isolamento & purificação , Dióxido de Silício/efeitos da radiação , Análise Espectral , Propriedades de Superfície , Volatilização , Difração de Raios X
4.
Phys Rev B Condens Matter ; 53(8): 4557-4564, 1996 Feb 15.
Artigo em Inglês | MEDLINE | ID: mdl-9984013
6.
Phys Rev Lett ; 73(23): 3129-3132, 1994 Dec 05.
Artigo em Inglês | MEDLINE | ID: mdl-10057295
7.
Phys Rev Lett ; 72(7): 1044-1047, 1994 Feb 14.
Artigo em Inglês | MEDLINE | ID: mdl-10056603
9.
Phys Rev B Condens Matter ; 42(12): 7671-7674, 1990 Oct 15.
Artigo em Inglês | MEDLINE | ID: mdl-9994925
10.
12.
Phys Rev B Condens Matter ; 33(2): 873-878, 1986 Jan 15.
Artigo em Inglês | MEDLINE | ID: mdl-9938346
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