RESUMO
There are few materials that are broadly used for fabricating optical metasurfaces for visible light applications. Gallium phosphide (GaP) is a material that, due to its optical properties, has the potential to become a primary choice but due to the difficulties in fabrication, GaP thin films deposited on transparent substrates have never been exploited. In this article we report the design, fabrication, and characterization of three different amorphous GaP metasurfaces obtained through sputtering. Although the material properties can be further optimized, our results show the potential of this material for visible applications making it a viable alternative in the material selection for optical metasurfaces.
RESUMO
Metasurfaces have facilitated the replacement of conventional optical elements with ultrathin and planar photonic structures. Previous designs of metasurfaces were limited to small deflection angles and small ranges of the angle of incidence. Here, we have created two types of Si-based metasurfaces to steer visible light to a large deflection angle. These structures exhibit high diffraction efficiencies over a broad range of angles of incidence. We have demonstrated metasurfaces working both in transmission and reflection modes based on conventional thin film silicon processes that are suitable for the large-scale fabrication of high-performance devices.
RESUMO
Nanoimprint lithography (NIL) of functional high-refractive index materials has proved to be a powerful candidate for the inexpensive manufacturing of high-resolution photonic devices. In this paper, we demonstrate the fabrication of printable photonic crystals (PhCs) with high refractive index working in the visible wavelengths. The PhCs are replicated on a titanium dioxide-based high-refractive index hybrid material by reverse NIL with almost zero shrinkage and high-fidelity reproducibility between mold and printed devices. The optical responses of the imprinted PhCs compare very well with those fabricated by conventional nanofabrication methods. This study opens the road for a low-cost manufacturing of PhCs and other nanophotonic devices for applications in visible light.
RESUMO
We report a novel nanofabrication method to fabricate printable integrated circuits with a high refractive index working in the visible wavelength range. The printable planar ligthwave circuits are directly imprinted by ultra-violet nanoimprinting into functional TiO2-based resist on the top of planar waveguide core films. The printed photonic circuits are composed of several elementary components including ridge waveguides, light splitters and digital planar holograms. Multi-mode ridge waveguides with propagation losses around 40 dB cm(-1) at 660 nm wavelength, and, on-chip demultiplexers operated in the visible range with 100 channels and a spectral channel spacing around 0.35 nm are successfully demonstrated.
RESUMO
A novel and robust route for high-throughput, high-performance nanophotonics-based direct imprint of high refractive index and low visible wavelength absorption materials is presented. Sub-10 nm TiO2 nanostructures are fabricated by low-pressure UV-imprinting of an organic-inorganic resist material. Post-imprint thermal annealing allows optical property tuning over a wide range of values. For instance, a refractive index higher than 2.0 and an extinction coefficient close to zero can be achieved in the visible wavelength range. Furthermore, the imprint resist material permits fabrication of crack-free nanopatterned films over large areas and is compatible for fabricating printable photonic structures.
RESUMO
An original and low cost method for the fabrication of patterned surfaces bioinspired from butterfly wings and lotus leaves is presented. Silica-based sol-gel films are thermally imprinted from elastomeric molds to produce stable structures with superhydrophobicity values as high as 160 degrees water contact angle. The biomimetic surfaces are demonstrated to be tuned from superhydrophobic to superhydrophilic by annealing between 200 degrees C and 500 degrees C.