RESUMO
The growth and performance of top-illuminated metamorphic In(0.20)Ga(0.80)As p-i-n photodetectors grown on GaAs substrates using a step-graded In(x)Ga(1-x)As buffer is reported. The p-i-n photodetectors display a low room-temperature reverse bias dark current density of ~1.4×10(-7) A/cm(2) at -2 V. Responsivity and specific detectivity values of 0.72 A/W, 2.3×10(12) cm·Hz(1/2)/W and 0.69 A/W, 2.2×10(12) cm·Hz(1/2)/W are achieved for Yb:YAG (1030 nm) and Nd:YAG (1064 nm) laser wavelengths at -2 V, respectively. A high theoretical bandwidth-responsivity product of 0.21 GHz·A/W was estimated at 1064 nm. Device performance metrics for these GaAs substrate-based detectors compare favorably with those based on InP technology due to the close tuning of the detector bandgap to the target wavelengths, despite the presence of a residual threading dislocation density. This work demonstrates the great potential for high performance metamorphic near-infrared InGaAs detectors with optimally tuned bandgaps, which can be grown on GaAs substrates, for a wide variety of applications.
RESUMO
Model metal-semiconductor nanostructure Schottky nanocontacts were made on cleaved heterostructures containing GaAs quantum wells (QWs) of varying width and were locally probed by ballistic electron emission microscopy. The local Schottky barrier was found to increase by approximately 0.140 eV as the QW width was systematically decreased from 15 to 1 nm, due mostly to a large (approximately 0.200 eV) quantum-confinement increase to the QW conduction band. The measured barrier increase over the full 1 to 15 nm QW range was quantitatively explained when local "interface pinning" and image force lowering effects are also considered.
