RESUMO
The demand for ion beam sputtering (IBS) coated substrates is growing. In order to introduce IBS technology into new fields of application, the uniform deposition area (UDA) must be further increased. In the present investigation, a simple approach toward enlarging a UDA and the corresponding scaling laws are presented. By taking symmetry properties into account, the collection efficiency of the sputtered particles could be doubled. A process is demonstrated which allows the simultaneous and uniform coating of two areas each with a diameter of 600 mm.
RESUMO
We report on the correlation between the laser damage resistance, the optical and the physical properties of Sc(2)O(3)/SiO(2) mixture coatings. Several sets of samples with ten different mixture ratios have been prepared by ion-beam sputtering. The atomic compositions of the mixture thin films are quantified employing x-ray photoelectron spectroscopy depth profiles. Laser-induced damage thresholds are determined with single subpicosecond pulses (500 fs) at 1030 nm. Furthermore, Son1 multishot measurements are realized in the ultraviolet wavelength range (355 nm) at pulse durations of 5 ns. In addition, the influence of two different substrate polishing qualities on the radiation resistance of the composite thin films is discussed.
RESUMO
Laser-induced damage in the nanosecond domain has been connected to the heating and breakdown of local defects within the thin film and the various interfaces. Within the femtosecond regime, the damaging events can be traced back to multiphoton-based excitation into the conduction band. When critical electron density is exceeded, an optical breakdown will occur. In this Letter we report on evidence that two-photon absorption also significantly triggers laser-induced damage in Ta(2)O(5) thin films at 532 nm and 8 ns pulse duration. For experimental verification, single layers of Ta(2)O(5)/SiO(2) mixtures have been analyzed.
