The growth mechanism and intriguing optical and electronic properties of few-layered HfS2.

Due to electronic properties superior to group VIB (Mo and W) transition metal dichalcogenides (TMDs), group IVB (Hf and Zr) TMDs have become intriguing materials in next-generation nanoelectronics. Therefore, the growth of few-layered hafnium disulfide (HfS2) on c-plane sapphire as well as on a SiO2/Si substrate has been demonstrated using chemical vapour deposition (CVD). The structural properties of HfS2 were investigated by recording X-ray diffraction patterns and Raman spectra. The XRD results reveal that the layers are well oriented along the (0001) direction and exhibit the high crystalline quality of HfS2. The Raman spectra confirm the in-plane and out-plane vibration of Hf and S atoms. Moreover, the HfS2 layers exhibit strong absorption in the UV to visible region. The HfS2 layer-based photodetector shows a photoresponsivity of ∼1.6, ∼0.38, and ∼0.21 µA W-1 corresponding to 9, 38, and 68 mW cm-2, respectively under green light illumination and is attributed to the generation of a large number of electron-hole pairs in the active region of the device. Besides, it also exhibits the highly crystalline structure of HfS2 at high deposition temperature. The PL spectrum shows a single peak at ∼1.8 eV and is consistent with the pristine indirect bandgap of HfS2 (∼2 eV). Furthermore, a few layered HfS2 back gate field-effect transistor (FET) is fabricated based on directly grown HfS2 on SiO2/Si, and the device exhibits p-type behaviour. Thus, the controllable and easy growth method opens the latest pathway to synthesize few layered HfS2 on different substrates for various electronic and optoelectronic devices.

[Removal of nickel from aqueous solutions using complexation-ultrafiltration process].

Polyacrylate (PAANa) and polyethylenimine (PEI) were used as complexing agents to combine with nickel ions. This complexation solution was transferred to the ultrafiltration cell and the separation by polyethersulfone (PES) ultrafiltration membranes was carried out under the pressure of 0.1 MPa. Effects of solution pH and polymer/Ni2+ mass ratio on nickel removal were investigated. The complex reaction equilibrium constants were calculated according to Langmuir isotherm model. Effects of concentration time on nickel removal and membrane flux were also studied. With PAANa as a polymer, the removal rate of nickel went the highest to 99.5% at pH 8 with PAANa/Ni2+ ratio of 5. When PEI was used, the removal rate of nickel ions went highest to 93.0% at pH 7 with PEI/Ni2+ ratio of 5. Best-fit complexation equilibrium constants at different pH values showed that pH 7 was most beneficial to the complex reaction. In addition, the number of nickel ions bound to a single monomer complexing agent increased with increase of pH value. During 12 h ultrafiltration process, the decline of membrane flux was less than 10% with PAANa as the complexing agent, while the membrane flux remains the same when PEI was used. The removal rates of Ni2+ kept constant with both complexing agents. Results showed that complexation-ultrafiltration can effectively remove nickel from aqueous solution at appropriate conditions.

[Comparison of the effect of solution environment on humic acid removal behavior with charged and traditional neutral ultrafiltration membranes].

Experiments were performed to evaluate the effect of solution environment (pH value, ionic strength and Ca2+) on humic acid removal and membrane fouling during filtration of humic acid through charge-modified regenerated (RC) ultrafiltration (UF) membrane and traditional unmodified neutral RC UF membrane. Results showed that: (1) the pH value changed the net charge on humic acid molecule and charged membrane through protonation effect, which further influenced the ultrafiltration behavior. When the solution pH value decreased from 7.5 to 3.5, the rejection coefficient of HA decreased from 92% to 79%, and the flux decline increased from 26% to 36% at 4 h filtration time on charged UF membrane; (23) the ionic strength influenced the ultrafiltration behavior through the change of humic acid molecule property and electrostatic shielding effect. In each solution with ionic strength of 0 mmol/L, 3 mmol/L and 100 mmol/L, the rejection coefficient decreased with the value of 92%, 87% and 48% respectively, and the flux decline increased with the value of 26%, 35% and 63% respectively at 4 h filtration time on charged membranes; (3) the effect of Ca2+ concentration on ultrafiltration behavior was due to the complementary effects of electrostatic shielding, Ca2+ bridge and the compact property of the cake layer. (4) the effect of pH value, ionic strength and Ca2+ concentration on the neutral membrane was similar to that on the charged membrane, but in different degrees. Results provide important guidance on the choice of appropriate solution environment when using charged ultrafiltration technology.

[Effect of charged ultrafiltration membrane on natural organic matter removal and membrane fouling].

With the deterioration of water pollution and stringency of water standards, ultrafiltration (UF) has become one of the best alternatives replacing conventional drinking water treatment technologies. However, UF is not very effectively to remove natural organic matter (NOM) due to the comparatively large pore size compared to the size of NOM. Fouling issue is another factor that restricts its widespread application. The rejection coefficient and flux decline during ultrafiltration of humic acid (HA) and raw water through neutral unmodified and negatively charge-modified regenerated cellulose (RC) membranes were investigated, and the analysis for membrane resistance was provided. The initial removal rate for HA is 59% and the flux decline is 32% on neutral unmodified RC membrane with MWCO of 100 x 10(3), while the initial removal rate for HA increases to 92% and the flux decline decreases to 25% on negatively charge-modified RC membrane. Compared to neutral unmodified RC membrane, the removal rate for NOM on negatively charge-modified RC membrane increases 20% and the flux decline decreases 12%. Results indicated that charged UF membrane could be an effective way for better removal of NOM and reduction of the membrane fouling due to the electrostatic interaction with the combination effect of membrane pore size.

[Removal of lead from aqueous solutions by complexation-ultrafiltration with chitosan].

Polyethersulphone (PES) membrane was chosen and chitosan was used as complexing agent to remove lead ions by complexation-ultrafiltration. Effects of solution pH, Pb2+/chitosan ratio, ionic strength and Ca2+ on the rejection coefficient of lead were investigated. The effect of concentration time on lead rejection coefficient and membrane flux was also studied. The value of pH was found to be the key parameter in the process of complexation-ultrafiltration. The rejection coefficient of lead goes high to over 99% at pH 6.0 with the Pb2+/chitosan ratio 0.25. The increase of ionic strength and Ca2+ is not beneficial to the lead removal by complexation-ultrafiltration. The chitosan-metal complex was acidified and then the chitosan was regenerated by diafiltration. The regenerated chitosan was used to remove Pb2+ by complexation-ultrafiltration, and the rejection coefficient of lead was found to be 96.2%, which shows no significant difference with that obtained on the fresh chitosan. Results showed that complexation-ultrafiltration can effectively remove lead from aqueous solutions and chitosan can be effectively regenerated.