An easy to construct sub-micron resolution imaging system.

We report an easy to construct imaging system that can resolve particles separated by [Formula: see text] 0.68 [Formula: see text]m with minimum aberrations. Its first photon collecting lens is placed at a distance of 31.6 mm giving wide optical access. The microscope has a Numerical Aperture (NA) of 0.33, which is able to collect signal over 0.36 sr. The diffraction limited objective and magnifier recollects 77% photons into the central disc of the image with a transverse spherical aberration of 0.05 mm and magnification upto 238. The system has a depth of field of 142 [Formula: see text]m and a field of view of 56 [Formula: see text]m which images a large ensemble of atoms. The imaging system gives a diffraction limited performance over visible to near-infrared wavelengths on optimization of the working distance and the distance between the objective and magnifier.

Atomic flux distribution from a low-divergent dark wall oven.

Nearly collimated atomic beam is of interest for a variety of experiments. This article reports a simple way of modifying the atomic beam distribution using a dark wall oven and describes detailed study of outcoming atoms' spatial distribution. A simple design is obtained by employing the fact that inhomogeneous thermal distribution along a capillary results due to its partial resistive heating. Based on this phenomenon, we have designed a dark wall oven consisting of a reservoir, collimator, and cold absorber at the exit end of atoms, where all three are fabricated out of a single stainless steel capillary. The nearly collimated spatial distribution of the atoms resulting due to the absorber eliminating the atoms diverging above a certain angle is modeled and experimentally verified. A divergence as minimum as 1.2(1)° corresponding to a half angle θ1/2 = 0.9(1)° is measured at an oven temperature of 250 °C that produces an atomic flux of about 8 × 109 atoms s-1. Total flux as estimated using our measured spatial distribution of atoms matches well with the numerically simulated values of it for the dark wall oven.

Estimation of the ion-trap assisted electrical loads and resulting BBR shift.

Capacitive, inductive and resistive loads of an ion-trap system, which can be modelled as LCR circuits, are important to know for building a high accuracy experiment. Accurate estimation of these loads is necessary for delivering the desired radio frequency (RF) signal to an ion trap via an RF resonator. Of particular relevance to the trapped ion optical atomic clock, determination of these loads lead to accurate evaluation of the Black-Body Radiation (BBR) shift resulting from the inaccurate machining of the ion-trap itself. We have identified different sources of these loads and estimated their values using analytical and finite element analysis methods, which are found to be well in agreement with the experimentally measured values. For our trap geometry, we obtained values of the effective inductive, capacitive and resistive loads as: 3.1 µH, 3.71 (1) µH, 3.68 (6) µH; 50.4 pF, 51.4 (7) pF, 40.7 (2) pF; and 1.373 Ω, 1.273 (3) Ω, 1.183 (9) Ω by using analytical, numerical and experimental methods, respectively. The BBR shift induced by the excess capacitive load arising due to machining inaccuracy in the RF carrying parts has been accurately estimated, which results to a fractional frequency shift of 6.6 × 10-17 for an RF of 1 kV at 2π × 15 MHz and with ±10 µm machining inaccuracy. This needs to be incorporated into the total systematic uncertainty budget of a frequency standard as it is about one order of magnitude higher than the present precision of the trapped ion optical clocks.