Boron-Implanted Silicon Substrates for Physical Adsorption of DNA Origami.

DNA nanostructures routinely self-assemble with sub-10 nm feature sizes. This capability has created industry interest in using DNA as a lithographic mask, yet with few exceptions, solution-based deposition of DNA nanostructures has remained primarily academic to date. En route to controlled adsorption of DNA patterns onto manufactured substrates, deposition and placement of DNA origami has been demonstrated on chemically functionalized silicon substrates. While compelling, chemical functionalization adds fabrication complexity that limits mask efficiency and hence industry adoption. As an alternative, we developed an ion implantation process that tailors the surface potential of silicon substrates to facilitate adsorption of DNA nanostructures without the need for chemical functionalization. Industry standard 300 mm silicon wafers were processed, and we showed controlled adsorption of DNA origami onto boron-implanted silicon patterns; selective to a surrounding silicon oxide matrix. The hydrophilic substrate achieves very high surface selectivity by exploiting pH-dependent protonation of silanol-groups on silicon dioxide (SiO2), across a range of solution pH values and magnesium chloride (MgCl2) buffer concentrations.

Controlling nanowear in a polymer by confining segmental relaxation.

Molecular relaxation of a copolymer designed for nano-electromechanical systems was chemically confined by varying the spacing between cross-links, delta(c). A critical cross-link spacing of 1-3 nm marks a transition in the nano-mechanical properties evaluated by atomic force microscopy. The transition reveals an interplay between the cross-link spacing and the length scale for backbone relaxation, xi(alpha), in cooperatively rearranging regions. For delta(c) >> xi(alpha), the natural backbone relaxation process is relatively unaffected by the cross-links and a ductile, low hardness behavior results. For delta(c) < xi(alpha), the cross-links directly interfere with backbone relaxation and confine segmental mobility, leading to a brittle, high hardness response.

Molecular dissipation phenomena of nanoscopic friction in the heterogeneous relaxation regime of a glass former.

Nanoscale sliding friction involving a polystyrene melt near its glass transition temperature Tg (373 K) exhibited dissipation phenomena that provide insight into the underlying molecular relaxation processes. A dissipative length scale that shows significant parallelism with the size of cooperatively rearranging regions (CRRs) could be experimentally deduced from friction-velocity isotherms, combined with dielectric loss analysis. Upon cooling to approximately 10 K above Tg, the dissipation length Xd grew from a segmental scale of approximately 3 A to 2.1 nm, following a power-law relationship with the reduced temperature Xd approximately TR-phi. The resulting phi=1.89+/-0.08 is consistent with growth predictions for the length scale of CRRs in the heterogeneous regime of fragile glass formers. Deviations from the power-law behavior closer to Tg suggest that long-range processes, e.g., the normal mode or ultraslow Fischer modes, may couple with the alpha relaxation, leading to energy dissipation in domains of tens of nanometers.

Interfacial glass transition profiles in ultrathin, spin cast polymer films.

Interfacial glass transition temperature (T(g)) profiles in spin cast, ultrathin films of polystyrene and derivatives were investigated using shear-modulated scanning force microscopy. The transitions were measured as a function of film thickness (delta), molecular weight, and crosslinking density. The T(g)(delta) profiles were nonmonotonic and exhibited two regimes: (a) a sublayer extending about 10 nm from the substrate, with T(g) values lowered up to approximately 10 degrees C below the bulk value, and (b) an intermediate regime extending over 200 nm beyond the sublayer, with T(g) values exceeding the bulk value by up to 10 degrees C. Increasing the molecular weight was found to shift the T(g)(delta) profiles further from the substrate interface, on the order of 10 nm/kDa. Crosslinking the precast films elevated the absolute T(g) values, but had no effect on the spatial length scale of the T(g)(delta) profiles. These results are explained in the context of film preparation history and its influence on molecular mobility. Specifically, the observed rheological anisotropy is interpreted based on the combined effects of shear-induced structuring and thermally activated interdiffusion.

Creeping friction dynamics and molecular dissipation mechanisms in glassy polymers.

The dissipation mechanism of nanoscale kinetic friction between an atomic force microscopy tip and a surface of amorphous glassy polystyrene has been studied as a function of two parameters: the scanning velocity and the temperature. Superposition of the friction results using the method of reduced variables revealed the dissipative behavior as an activated relaxation process with a potential barrier height of 7.0 kcal/mol, corresponding to the hindered rotation of phenyl groups around the C-C bond with the backbone. The velocity relationship with friction F(v) was found to satisfy simple fluctuation surface potential models with F proportional to const-ln(v) and F proportional to const-ln(v)2/3.