Desulfurization of Biomass Syngas Using ZnO-Based Adsorbents: Long-Term Hydrogen Sulfide Breakthrough Experiments.

Dry-bed adsorptive desulfurization of biomass-based syngas with low to medium sulfur content using ZnO was investigated as an alternative to the conventional wet scrubbing processes. The technical feasibility of ZnO-based desulfurization was studied in laboratory-scale H2S breakthrough experiments. The experiments were set up to utilize realistic H2S concentrations from gasification and therefore long breakthrough times. Experiments were performed in a steam-rich model biosyngas in varying conditions. The long-term breakthrough experiments showed apparent ZnO utilization rates between 10 and 50% in the tested conditions, indicating intraparticle mass-transfer resistances partly due to space velocity and particle size constraints as well as the most likely product-layer resistances as evidenced by the large spent adsorbent surface area decrease. An empirical deactivation model to estimate full breakthrough curves was fitted to the laboratory-scale experimental data. Breakthrough experiment in tar-rich syngas was also performed with the conclusion that ZnO performance is not significantly affected by hydrocarbons despite carbon deposition on the particle surfaces.

Experimental Bench-Scale Study of Residual Biomass Syngas Desulfurization Using ZnO-Based Adsorbents.

Dry-bed adsorptive desulfurization of biomass-based syngas with a low- to medium sulfur content using ZnO was studied as an alternative to conventional wet-scrubbing processes for a small- to medium-scale biomass-to-liquid process concept. Following laboratory-scale long-term H2S breakthrough experiments in a previous study, desulfurization tests were scaled-up to bench-scale with actual bio-syngas to verify the lab-scale results under more realistic process conditions. A desulfurization unit was constructed and connected to a steam-blown atmospheric pilot-scale fluidized bed gasifier. Two successful 70+ h test campaigns were conducted with H2S removal below the breakthrough limit using full-sized ZnO adsorbent particles. Scanning electron microscopy (SEM), energy-dispersive X-ray spectroscopy elemental analysis, and Brunauer-Emmett-Teller (BET) surface area characterization of the fresh and spent adsorbent pellets were performed. SEM micrographs displayed the outward enlarging particle size in the sulfided layer. Characterization showed significant core-shell sulfidation behavior with a few hundred micron-thick sulfided layer leaving the majority of ZnO unutilized. Adsorbents lost most of their porosity in use, which was evident from BET surface area results. Simultaneous COS removal was found possible by the hydrolysis reaction to H2S. Furthermore, evidence of minor chlorine adsorption was found, thus highlighting the need for a dedicated HCl removal step upstream of desulfurization.

Molecular Layer Deposition Using Ring-Opening Reactions: Molecular Modeling of the Film Growth and the Effects of Hydrogen Peroxide.

Novel coating materials are constantly needed for current and future applications in the area of microelectronics, biocompatible materials, and energy-related devices. Molecular layer deposition (MLD) is answering this cry and is an increasingly important coating method for organic and hybrid organic-inorganic thin films. In this study, we have focused on hybrid inorganic-organic coatings, based on trimethylaluminum, monofunctional aromatic precursors, and ring-opening reactions with ozone. We present the MLD processes, where the films are produced with trimethylaluminum, one of the three aromatic precursors (phenol, 3-(trifluoromethyl)phenol, and 2-fluoro-4-(trifluoromethyl)benzaldehyde), ozone, and the fourth precursor, hydrogen peroxide. According to the in situ Fourier-transform infrared spectroscopy measurements, the hydrogen peroxide reacts with the surface carboxylic acid group, forming a peroxyacid structure (C(O)-O-OH), in the case of all three processes. In addition, molecular modeling for the processes with three different aromatic precursors was carried out. When combining these modeling results with the experimental research data, new interesting aspects of the film growth, reactions, and properties are exploited.

Low-temperature atomic layer deposition of SiO2/Al2O3 multilayer structures constructed on self-standing films of cellulose nanofibrils.

In this paper, we have optimized a low-temperature atomic layer deposition (ALD) of SiO2 using AP-LTO® 330 and ozone (O3) as precursors, and demonstrated its suitability to surface-modify temperature-sensitive bio-based films of cellulose nanofibrils (CNFs). The lowest temperature for the thermal ALD process was 80°C when the silicon precursor residence time was increased by the stop-flow mode. The SiO2 film deposition rate was dependent on the temperature varying within 1.5-2.2 Å cycle-1 in the temperature range of 80-350°C, respectively. The low-temperature SiO2 process that resulted was combined with the conventional trimethyl aluminium + H2O process in order to prepare thin multilayer nanolaminates on self-standing CNF films. One to six stacks of SiO2/Al2O3 were deposited on the CNF films, with individual layer thicknesses of 3.7 nm and 2.6 nm, respectively, combined with a 5 nm protective SiO2 layer as the top layer. The performance of the multilayer hybrid nanolaminate structures was evaluated with respect to the oxygen and water vapour transmission rates. Six stacks of SiO2/Al2O with a total thickness of approximately 35 nm efficiently prevented oxygen and water molecules from interacting with the CNF film. The oxygen transmission rates analysed at 80% RH decreased from the value for plain CNF film of 130 ml m-2 d-1 to 0.15 ml m-2 d-1, whereas the water transmission rates lowered from 630 ± 50 g m-2 d-1 down to 90 ± 40 g m-2 d-1This article is part of a discussion meeting issue 'New horizons for cellulose nanotechnology'.

Low-Temperature Molecular Layer Deposition Using Monofunctional Aromatic Precursors and Ozone-Based Ring-Opening Reactions.

Molecular layer deposition (MLD) is an increasingly used deposition technique for producing thin coatings consisting of purely organic or hybrid inorganic-organic materials. When organic materials are prepared, low deposition temperatures are often required to avoid decomposition, thus causing problems with low vapor pressure precursors. Monofunctional compounds have higher vapor pressures than traditional bi- or trifunctional MLD precursors, but do not offer the required functional groups for continuing the MLD growth in subsequent deposition cycles. In this study, we have used high vapor pressure monofunctional aromatic precursors in combination with ozone-triggered ring-opening reactions to achieve sustained sequential growth. MLD depositions were carried out by using three different aromatic precursors in an ABC sequence, namely with TMA + phenol + O3, TMA + 3-(trifluoromethyl)phenol + O3, and TMA + 2-fluoro-4-(trifluoromethyl)benzaldehyde + O3. Furthermore, the effect of hydrogen peroxide as a fourth step was evaluated for all studied processes resulting in a four-precursor ABCD sequence. According to the characterization results by ellipsometry, infrared spectroscopy, and X-ray reflectivity, self-limiting MLD processes could be obtained between 75 and 150 °C with each of the three aromatic precursors. In all cases, the GPC (growth per cycle) decreased with increasing temperature. In situ infrared spectroscopy indicated that ring-opening reactions occurred in each ABC sequence. Compositional analysis using time-of-flight elastic recoil detection indicated that fluorine could be incorporated into the film when 3-(trifluoromethyl)phenol and 2-fluoro-4-(trifluoromethyl)benzaldehyde were used as precursors.