Assessment of gliosis around moveable implants in the brain.

Repositioning microelectrodes post-implantation is emerging as a promising approach to achieve long-term reliability in single neuronal recordings. The main goal of this study was to (a) assess glial reaction in response to movement of microelectrodes in the brain post-implantation and (b) determine an optimal window of time post-implantation when movement of microelectrodes within the brain would result in minimal glial reaction. Eleven Sprague-Dawley rats were implanted with two microelectrodes each that could be moved in vivo post-implantation. Three cohorts were investigated: (1) microelectrode moved at day 2 (n = 4 animals), (2) microelectrode moved at day 14 (n = 5 animals) and (3) microelectrode moved at day 28 (n = 2 animals). Histological evaluation was performed in cohorts 1-3 at four-week post-movement (30 days, 42 days and 56 days post-implantation, respectively). In addition, five control animals were implanted with microelectrodes that were not moved. Control animals were implanted for (1) 30 days (n = 1), (2) 42 days (n = 2) and (3) 56 days (n = 2) prior to histological evaluation. Quantitative assessment of glial fibrillary acidic protein (GFAP) around the tip of the microelectrodes demonstrated that GFAP levels were similar around microelectrodes moved at day 2 when compared to the 30-day controls. However, GFAP expression levels around microelectrode tips that moved at day 14 and day 28 were significantly less than those around control microelectrodes implanted for 42 and 56 days, respectively. Therefore, we conclude that moving microelectrodes after implantation is a viable strategy that does not result in any additional damage to brain tissue. Further, moving the microelectrode downwards after 14 days of implantation may actually reduce the levels of GFAP expression around the tips of the microelectrodes in the long term.

Thin microelectrodes reduce GFAP expression in the implant site in rodent somatosensory cortex.

The objective of this study was to test the hypothesis that neural implants with reduced cross-sectional areas will have less glial scarring associated with implantation injury in long-term experiments. In this study, we implanted nine adult rats with two different implants of 12 microm (n = 6), and 25 microm (n = 6) diameters (cross-sectional areas of 68 microm(2), 232 microm(2) respectively) and the expression of glial fibrilliary acidic protein (GFAP) was assessed after 2 weeks and 4 weeks of implantation. In order to facilitate implantation, the 12 microm diameter implants were coated with poly-glycolic acid (PGA), a biodegradable polymer that degraded within minutes of implantation. In n = 3 animals, 25 microm diameter implants also coated with PGA were implanted and assessed for GFAP expression at the end of 4 weeks of implantation. Statistical analysis of the GFAP expression around the different implants demonstrated that after 2 weeks of implantation there is no statistically significant difference in GFAP expression between the 12 microm and the 25 microm diameter implants. However, after 4 weeks of implantation the implant site of 12 microm diameter implants exhibited a statistically significant reduction in GFAP expression when compared to the implant sites of the 25 microm diameter implants (both with and without the PGA coating). We conclude that in neural implants that are tethered to the skull, implant cross-sectional areas of 68 microm(2) and smaller could lead to a reduced glial scarring under chronic conditions. Future studies with longer implant durations can confirm if this observation remains consistent beyond 4 weeks.