RESUMO
PURPOSE: To study the influence of TiO2 and methacrylic acid on self-cleaning and antimicrobial properties of denture base resin. METHODS: TiO2 (2%, 4%, 6%) and methacrylic acid were respectively added into two makers' denture base resins. The self-cleaning property was assayed with measuring the decomposition of methylthioninium chloride. The antimicrobial property was tested with the pellicle-sticking method. The data were analysed by SPSS 12.0 software package for two-way ANOVA. RESULTS: The self-cleaning and antimicrobial properties of samples were improved as TiO2 increased. Methacrylic acid had no significant influence on self-cleaning and antimicrobial properties of the samples. The decomposition ratio and antimicrobial ratio of MTi4% (Rijin) were 53.96% and 71.42%, respectively. CONCLUSION: Methacrylic acid coupled TiO2/PMMA denture base resin enjoys good self-cleaning and antimicrobial properties.
